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Improved Method to Produce Nanometer-scale Patterns
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Improved Method to Produce Nanometer-scale Patterns

June 22, 2010
Improved Method to Produce Nanometer-scale Patterns Georgia Tech researchers use atomic force microscopy (AFM) -generated images to analyze nanometer-scale structures. Shown are William King, assistant professor in the Georgia Institute of Technology's School of Mechanical Engineering (standing), and graduate research assistants Brent Nelson (left) and Tanya Wright. Researchers from the Georgia Institute of Technology and the Naval Research Laboratory (NRL) have developed an improved method for directly writing nanometer-scale patterns onto a variety of surfaces. The new writing method, dubbed thermal dip pen nanolithography, represents an important extension for dip pen nanolithography (DPN), an increasingly popular technique that uses AFM probes as pens to produce nanometer-scale patterns. The research was sponsored by the National Science Foundation, Office of Naval Research and Air Force Office of Scientific Research. To learn more, see the Aug. 30, 2004, Georgia Tech Research News, "Tiny Writing: Researchers Develop Improved Method to Produce Nanometer-scale Patterns." (Date of Image: August 2004)


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