Picosun Launches New Source System for Extremely Low Vapor Pressure and Heat Sensitive ALD Precursors
ESPOO, Finland, June 20, 2012 /PRNewswire/ –
Picosun Oy, Finland-based, globally operating manufacturer of state-of-the-art Atomic
Layer Deposition (ALD) systems, has launched its new heated and boosted source system
called Picohot(TM) 300.
Picohot(TM) 300 has been designed specifically for PICOSUN(TM) P-series
production-scale ALD systems. It has very large surface area for precursor vaporization,
two computer-controlled three-way pneumatic valves for pulsing and it can reach the
maximum temperature of 300 oC. Temperature-controlled conduits finalize efficient
vaporization and delivery of the precursor. The maximum volume of precursor that can be
filled into the source is 300 ml, which ensures extended operation times of the ALD tool
without the need to stop the process for re-filling the precursor source vessel.
Very good deposition results have been obtained with the Picohot(TM) 300 source system
in batch processes. For example, for tantalum oxide batch process (with tantalum (I)
ethoxide and water as precursors) within-wafer 1summation non-uniformity of 3.2 % and
wafer-to-wafer 1summation non-uniformity of 3.9 % have been obtained.
“Efficient precursor delivery systems are crucial for reliable, repeatable, high
throughput industrial quality ALD processes. There are several ALD precursors that are
very heat sensitive and need evaporation at as low temperatures as possible to avoid
undesired side reactions such as decomposition, polymerization or condensation between the
precursor molecules. Picohot(TM) 300 is designed to overcome the challenges with
precursors of extremely low volatility and/or temperature sensitivity. We are happy to
introduce the product to our customers in the most important ALD event of the year, the
international ALD conference taking place at the moment in the heart of Europe’s IC
manufacturing industry, in Dresden, Germany,” states Juhana Kostamo, Managing Director of
Picosun Oy is Finnish, world-wide operating manufacturer of state-of-the-art ALD
systems, representing continuity to almost four decades of pioneering, exclusive ALD
reactor design and manufacturing. Picosun’s global headquarters are located in Espoo,
Finland, its production facilities in Kirkkonummi, Finland, its US headquarters in
Detroit, Michigan, and its Asian headquarters in Singapore. Today, PICOSUN(TM) ALD tools
are in continuous production and R&D use in numerous frontline industries and research
organizations across four continents.
Juhana Kostamo, Managing Director (email firstname.lastname@example.org; tel.
SOURCE Picosun OY