Park Systems 2014 Announces Atomic Force Microscopy Image Contest Winner
Park Systems, a leader in Atomic Force Microscopy (AFM) since 1997 announces their first AFM image contest winner, Namuna Panday, a Graduate Student at Florida International University. Her winning submission is an AFM image taken using Park XE Bio of a HeLa Cell used in her research studying drug delivery methods for cancer research.
Santa Clara, CA (PRWEB) January 30, 2014
Park Systems, a leader in Atomic Force Microscopy (AFM) since 1997 announced today their first AFM image contest winner, Namuna Panday, a Graduate Student at Florida International University. Her winning AFM image taken using Park XE Bio is of a HeLa Cell used in her research studying drug delivery methods for cancer research. The Park Systems AFM photo contest was open to scientists, engineers, researchers and others who work with AFM who submitted their favorite AFM images with a chance to be selected to appear in the Park Systems 2014 calendar.
“The AFM image contest is a great way for us to interact with our users gaining more insight into their applications and sharing some holiday fun,” commented Keibock Lee, Park Systems President. “We are excited to invite AFM users to select their best images again for next year’s contest which we will showcase in our 2015 calendar. We are looking for images with outstanding quality and visual appeal showcasing nanotechnology’s most interesting applications.”
Panday’s winning AFM image, which appears in the Park Systems 2014 Calendar is a fascinating image of a HeLa cell created using Park XE-Bio, scanning ion conductance microscopy (SICM) mode with a glass nanopipette tip. It is a topography image the HeLa cell treated with 10 μM water soluble conjugated polymer nanoparticles for 1 hour at 37 °C. This image helps us understand how conjugated polymer nanoparticles (CPNs) interact with and enter cells and the research will help determine which bio materials are most effective to use during drug delivery for cancer treatment.
“Park Systems XE Bio dramatically extends our research technology by allowing us to review the cells in their native environment, thus enabling us to study how the cell reacts to each bio polymer in a controlled setting,” explains Namuna Panday. “We rely on Park XE Bio’s proven advanced nanotechnology design for our scientific research into how cells interact for cancer treatment, gene delivery and in other research in our labs because it is a very reliable and accurate AFM.”
Runners up for the AFM contest also appearing in the calendar are Ronaniel A. Almeda, Research Associate, University of the Philippines Los Baños, Dr. Gwan-Hyong Lee, Postdoctoral Research Scientist, Columbia University and Dr. Richard Piner, Research Scientist, University of Texas, Austin.
Details for next year’s AFM Photo contest will be available in August on the Park Systems web site. To receive a copy of this year’s calendar, contact Park Systems by email at Gerald(at)parkafm(dot)com or by phone at 408-986-1110.
About Park Systems
Park Systems serves its customers by providing a complete range of AFM solutions including AFM systems, options and software, along with global service and support. Park Systems is the leading nanotechnology solutions partner for nanoscale measurements and systems for both research and industry. The product line of Park Systems reflects its focused strength to help customers achieve the metrology performance that meets the needs and requirements of present and future applications. Since improvements in nanometrology are key to enabling tomorrow's research, analysis, processing and product manufacturing, the innovative technology and market leadership of Park Systems in the field of nanometrology will remain as the core competence and market driving force of its future business. Park’s manufacturing and engineering facilities are located in Suwon, South Korea. Global sales and service offices are located throughout the U.S., Japan, and Singapore. For more information, visit http://www.parkAFM.com.
For the original version on PRWeb visit: http://www.prweb.com/releases/2014/01/prweb11534628.htm