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Altatech Semiconductor Launches Dark-Field Inspection System for Wafers up to 450 mm

October 10, 2011

MONTBONNOT, France, Oct. 10, 2011 /PRNewswire/ — Altatech Semiconductor S.A. today introduced its new AltaSight DarkView® product, the company’s first substrate-inspection system to incorporate dark-field detection of defects on unpatterned wafers. This latest addition to the AltaSight family of high-performance, non-contact inspection and analysis products offers a full array of dark-field, reflectivity and topographical inspection technologies to provide 100% defect detection in a single pass through the system.

AltaSight DarkView incorporates multiple wavelength illumination and laser-scattering technology, combined with Altatech’s patented multi-orientation light-collection system, to perform simultaneous inspection across the frontsides, backsides and edges of bare substrates ranging in size from 100 mm to 450 mm. Applications include quality control of new silicon from wafer suppliers, inspection of engineered silicon-on-insulator (SOI) or epitaxial substrates, and detecting defects on the backsides of in-process patterned wafers.

With the ability to detect particles as small as 50 nm at throughputs of 100 wafers per hour, this new system – optimized for low cost of ownership – has the versatility to be used in R&D, process development or volume production.

“With the combined accuracy, productivity and flexibility of our new system, Altatech is continuing to stake out its position as a major player in the substrate-inspection market for semiconductors and LEDs,” said Jean-Luc Delcarri, president of Altatech Semiconductor.

AltaSight DarkView operates at a very high signal-to-noise ratio and provides superior detection results compared to other inspection systems on the market today. In addition, the system’s ability to locate and identify surface defects with any preferred orientation makes it highly reliable.

The new system is fully compatible with all other members of the AltaSight product line. It is available with the AltaSight EyeEdge® option, which enables detection and classification of defects as small as 2 microns within 1.5 mm of the edge of virtually any type of substrate. The edge-grip-only handling system provides a definite cleanliness advantage, especially for leading-edge chipmakers needing to perform pre-lithography inspection.

Altatech is now taking orders for AltaSight DarkView systems, and the first units are expected to begin shipping to customers in January 2012.

About Altatech Semiconductor S.A.

Incorporated in 2004, Altatech Semiconductor manufactures wafer inspection and analysis, liquid-vaporization CVD, and inkjet nanoprinting equipment at its headquarters facility near Grenoble and France’s epicenter of microelectronics production. Led by a management team with more than 30 years of experience in the semiconductor equipment industry, the company is focused on helping customers to achieve the fastest design-to-market cycle times for products serving the emerging semiconductor, MEMS and nanotechnology markets. For more information, visit www.altatech-sc.com.

SOURCE Altatech Semiconductor S.A.


Source: PR Newswire