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Last updated on April 19, 2014 at 21:20 EDT

Axcelis ‘Purion M’ Medium Current Implanter Selected By Leading Foundry For Advanced Logic Device Manufacturing

April 17, 2013

System Delivers Industry Leading Purity, Precision and Productivity for the Sub 2Xnm Era

BEVERLY, Mass., April 17, 2013 /PRNewswire/ — Axcelis Technologies, Inc. (Nasdaq: ACLS), a leading supplier of innovative, high-productivity solutions for the semiconductor industry, announced today that one of the world’s leading foundries has chosen the Company’s innovative Purion M((TM)) medium current implanter for their most advanced semiconductor manufacturing facility. The system will be used to design and manufacture next generation devices for the sub 2Xnm node.

Bill Bintz, executive vice president of product development, engineering and marketing commented, “We’re very excited about this new placement and growing our installed base as they expand their operations. The Purion M addresses some of the toughest challenges facing chip manufacturers as they move deeper into the nanotechnology era. Absolute implant precision and beam purity are paramount in achieving the process technology requirements and yield goals for sub 2X processes. The Purion M, the industry’s newest and most advanced medium current implanter is the only tool that meets those goals, while also achieving unmatched levels of manufacturing flexibility and capital efficiency, making it the implanter of choice for a high volume, leading edge foundry.”

The Purion M
The new Purion M medium current system utilizes Axcelis’ advanced spot beam line technology coupled with the Purion 500 WPH single wafer platform. This combination provides chip manufacturers with exceptional reliability, and remarkable precision and productivity for the widest range of implant energies and doses to address applications that include the formation of precise wells, channels and source/drain junctions. In addition, the system’s industry-leading energy range and beam currents enable it to be utilized for implant processes traditionally run on high energy or high current implanters, providing chipmakers with maximum manufacturing versatility and capital efficiency. The Purion M’s beam line design utilizes Axcelis’ patented angular energy filter and angle control system, eliminating all forms of energy contamination while ensuring the industry’s most accurate dopant placement. The result is an exceptionally pure and precise implant, enabling the highest production yields.

About Axcelis:
Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing innovative, high-productivity solutions for the semiconductor industry for over 35 years. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process. The Company’s Internet address is: www.axcelis.com.

CONTACTS:

Maureen Hart (editorial/media) 978.787.4266
maureen.hart@axcelis.com

Jay Zager (financial community) 978.787.9408
jay.zager@axcelis.com

SOURCE Axcelis Technologies, Inc.


Source: PR Newswire