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More Leading Semiconductor Players Selecting Jordan Valley’s JVX7300LMI Metrology Tool for 14nm & 10nm Process Development and Ramp-up

October 1, 2013

MIGDAL HAEMEK, Israel, October 1, 2013 /PRNewswire/ –

Jordan Valley Semiconductors [http://www.jordanvalley.com ] Ltd., a leading supplier
of X-ray based metrology tools for advanced semiconductor manufacturing lines, today
announced that it has received another order for its recently introduced JVX7300LMI
scanning X-ray in-line metrology tool for patterned and blanket wafers. The system has
been purchased for advanced process development and production ramp-up for 14nm and 10nm
nodes.

The tool provides fully automated advanced metrology for epitaxial materials such as
SiGe, Si:C/P and III-V on silicon FinFET structures, as well as high-k and metal gate
stacks and other critical layers.

Isaac Mazor, JV CEO, said: “We are pleased to have been selected by key customers to
support their FEOL (Front-End-Of-Line) process metrology. This selection represents the
customers’ confidence in Jordan Valley’s ability to provide valuable metrology solutions
for their most demanding advanced applications, trusting first principle X-ray based
metrology to provide unique process control solutions.”

Mazor added, “Advanced logic devices set new metrology challenges and requirements for
key transistor level structure such as FinFET, Ge & III/V materials on silicon, as well as
high-k and metal gate stacks used to enhance the transistor performance. Jordan Valley was
able to meet the customers’ stringent process requirements in a short period of
development time.

“In choosing the JVX7300LMI platform, the customers acknowledged the significant
contribution of the product in shortening the process development cycle, coupled with
enabling process performance and extendibility to future technology nodes.” Mazor
concluded, “We believe that the JVX7300LMI can be a strong contributor to assure high
yield in the current and next generation process nodes.”

About the JVX7300LMI metrology tool

The JVX7300LMI is an production worthy X-ray metrology system for 14nm & 10nm nodes
R&D and production ramp for FEOL applications such as SiGe, Si:C/P, FinFETs, high-k/metal
gate and replacement channel materials such as Ge and III-V layers on Si. It is also used
for the development and production of the emerging GaN on Si market.

This tool enables scanning HRXRD, XRR and (GI)XRD measurements. HRXRD is capable of
measuring epitaxial layer composition, thickness, density, strain and relaxation of single
and multi-layer stacks. Additionally, with XRR and (GI)XRD channels, the tool provides
information on the thickness, density, phase and crystallinity of ultra-thin layers
typically used in the FEOL process. Unlike optical or spectroscopic tools, the HRXRD and
XRR are first principle techniques that deliver accurate and precise results without
calibration.

About Jordan Valley Semiconductors Ltd.http://www.jvsemi.com

Jordan Valley Semiconductors (JVS), the leader in X-ray metrology and defect detection
tools for the semiconductor industry. Jordan Valley’s tools are fully automated
non-contacting and non-destructive tools designed for production control on patterned or
blanket wafers.

The company offers the semiconductor industry the most comprehensive portfolio of
advanced metrology and defect inspection tools, based on X-ray technologies such as XRR
(X-ray reflectomerty), XRF (X-ray fluorescence), XRD (X-ray diffraction) and others.

Jordan Valley’s investors include Clal Industries and Investments Ltd. (TASE: CII),
Intel Capital (NASDAQ: INTC) and Elron Electronics Industries Ltd. (TASE: ELRN).With
headquarters in Migdal Haemek Israel, the company has subsidiaries in Durham UK, Austin
TX, USA, Hsin-Chu Taiwan, Suwon Korea and other offices and sales representatives
worldwide.

        For more information:
        Alon Kapel,
        Director of Sales & Marketing
        Jordan Valley Semiconductors Ltd.
        Tel: +972-4-654-3666 x 134
        alon@jvsemi.com

SOURCE Jordan Valley Semiconductors Ltd.


Source: PR Newswire