TSMC Adopts Jordan Valley JVX 6200 for Copper Layer Metrology
Posted on: Tuesday, 14 April 2009, 23:01 CDT
MIGDAL HA'EMEK,
The evaluation of potential technologies - X-ray vs. opto-acoustic - "We found that X-ray reflectometry (XRR) demonstrated the required capability. Among the evaluated X-ray based tools, the JVX 6200 for its superior precision in the sub-angstrom range and for its lower total cost of ownership"
About X-ray Reflectometry
X-ray reflectometry is a no-contact, non-distractive, surface-sensitive technique that delivers precise and accurate characterization and metrology of thin films and multi-layer stacks. The technique delivers thickness, density and roughness data by analyzing the reflection vs. angle, and interference patterns of X-rays that reflect off the interfaces.
XRR is capable of analyzing single and multiple thin films layers from 1 to 500 nm thick. Jordan Valley's advanced XRR technology allows measurements on production wafers and offers superior throughput of over 30 WPH (17 points on 300mm wafer).
About TSMC
Established in 1987, Taiwan Semiconductor Manufacturing Company (TSMC) is the world's largest dedicated semiconductor foundry. As the founder and leader of the dedicated foundry business, TSMC has built its reputation on offering advanced wafer production processes and unparalleled manufacturing efficiency. From its inception, TSMC has consistently offered the foundry segment's leading technologies and TSMC COMPATIBLE design services to its customers. The company's total managed capacity exceeds 8 million 8-inch equivalent wafers in 2007, while its revenues represent some 50% of the dedicated foundry segment in the semiconductor industry.
About
Jordan Valley Semiconductors, Ltd. Is the leader of X-ray metrology for advanced semiconductors fabs. We provide semiconductor metrology solutions for thin films front end of line (FEOL) and back end of line (BEOL) based on novel, rapid and non-destructive x-ray technology. We offer a comprehensive family of solutions based on advanced X-Ray Reflectivity (XRR), X-Ray Fluorescence (XRF), X-Ray Fluorescence (XRF), Small-angle X-ray scattering (SAXS) and High Resolution X-Ray Diffractometry (HR XRD). These tools are fully automated, production ready, and ideal for both blanket and patterned wafers. Jordan Valley's x-ray technology enables accurate and precise characterization of all film types metals and dielectrics - including single and multi-layer stacks, high k, metal gate, low k materials. It is also used for strain engineering (SiGe, Si:C) and is used for advanced processes control (<45nm, 32nm) worldwide. Research and development are based in Migdal Ha'Emek,
Jordan Valley's primary shareholders are Clal Industries and Investments Ltd. (TASE:CII), Elron Electronic Industries Ltd. (Nasdaq: ELRN).
SOURCE Jordan Valley Semiconductors
Source: PR Newswire
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