U.S. Customer Qualifies Strasbaugh's New Endpoint Detection System for Production on its IPEC CMP Tools and Purchases System
Posted on: Wednesday, 5 August 2009, 06:00 CDT
SAN LUIS OBISPO, Calif., Aug. 5 /PRNewswire-FirstCall/ -- Strasbaugh (OTC Bulletin Board: STRB) announced today that a U.S. customer has qualified Strasbaugh's new nVision II CMP endpoint detection system for production and has placed a purchase order for the product. nVision II will be used to upgrade their IPEC CMP systems.
"We are pleased the first installation of our new nVision II endpoint upgrade for IPEC CMP systems has been accepted," said Michael Starman, Endpoint Product Manager, Strasbaugh. "nVision II should significantly improve the process performance and control of the IPEC equipment. It should also enable the customer to reduce set-up time, optimize consumables usage, and realize better wafer-to-wafer consistency," added Starman.
nVision II monitors optical, motor current, and/or pad temperature signals to determine a precise endpoint for CMP applications in the Semiconductor, Data Storage, and MEMS manufacturing markets.
About Strasbaugh
Strasbaugh has 60 years of leadership in design and manufacturing of advanced surfacing technology for the global semiconductor, silicon, data storage, MEMS, LED, telecommunications and optics industries. Through close alliances with premier manufacturers in these markets, Strasbaugh has developed pioneering technology that has become the standard in polishing and grinding today. With high-quality grinding tools, state-of-the-art prime wafer polishing and chemical mechanical planarization (CMP) systems, as well as leading edge process technology, Strasbaugh has enabled its customers to realize their performance targets and has built a reputation as a world class manufacturer of innovative, reliable, high-yield surfacing solutions.
Safe Harbor Statement Under the Private Securities Litigation Reform Act of 1995
With the exception of historical information, the matters discussed in this press release, including without limitation, statements regarding the ability of the nVision II to provide the benefits described are forward-looking statements that involve a number of risks and uncertainties. The actual future results of the nVision II could differ from those statements. Factors that could cause or contribute to such differences include, but are not limited to, the ability of the system to provide the benefits described, changes in technology and governmental regulations and policies, competitive products and services, unforeseen technical issues and those factors contained in the "Risk Factors" Section of Strasbaugh's Form 10-K for the year ended December 31, 2008, and other Strasbaugh filings with the Securities and Exchange Commission.
SOURCE Strasbaugh
Source: PR Newswire
Related Articles
- EV Group Installs Fusion Wafer Bonding Systems at Two Leading CMOS Image Sensor Manufacturing Facilities in Asia
- CoreFlow Introduces Wafer Singulation System for Crystalline PV Industry
- U.S. Customer Orders Strasbaugh nTellect Wafer Grinding System to Expand Capacity
- U.S. Customer Orders Strasbaugh nTegrity CMP System to Expand Capacity
- Strasbaugh's nTrepid CMP System Penetrates Japanese Market
- Strasbaugh Receives Order for Two Silicon Prime Wafer Polishing Systems
- Strasbaugh Wins $3.6M Order for Multiple Wafer Grinding Systems
- More Than 3,300 Gather for CMP Technology's 15th Annual Embedded Systems Conference Boston
- Aviza Technology Ships Next-Generation Single Wafer ALD System to Inotera Memories of Taiwan; Foundry Aims to Use Tool for 90-Nm DRAM Production
- APA Optics, Inc. Leases Space in Veeco's Facilities to Locate and Operate Its Multi-Wafer MOCVD System
User Comments (0)

RSS Feeds