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Last updated on May 22, 2013 at 12:50 EDT

Latest Atomic layer deposition Stories

2013-04-08 20:22:42

ESPOO, Finland, April 8, 2013 /PRNewswire/ -- Picosun Oy, leading Atomic Layer Deposition (ALD) equipment manufacturer, reports that its PICOPLATFORM(TM) 300 ALD cluster tool has been selected by a key customer in Asia for new memory applications. The 300 mm cluster design is based on the company's long-term top product, the fully automated, multifunctional PICOPLATFORM(TM) ALD deposition unit for parallel, simultaneous execution of several different processes for high-k and...

2013-03-04 20:23:25

ESPOO, Finland, March 4, 2013 /PRNewswire/ -- Picosun Oy, leading Atomic Layer Deposition (ALD) equipment manufacturer, and VTT Technical Research Centre of Finland report notable progress in continuous ALD technology. The water vapour and oxygen transmission rates measured from polymer films coated with thin ALD Al2O3 layer in Picosun's new roll-to-roll ALD deposition chamber were on a par with the values obtained with similar coating in a batch ALD process, thus proving...

2013-01-27 20:20:23

ESPOO, Finland, January 27, 2013 /PRNewswire/ -- Picosun Oy, leading Atomic Layer Deposition (ALD) equipment manufacturer expands its central role in the field of European semiconductor manufacturing by taking part in a yet new international R&D project, Lab4MEMS. The project started 1st January, 2013 and will run for two and a half years. Lab4MEMS is Picosun's fifth simultaneous European funded R&D project and strengthens directly the company's core competencies in...

2012-12-19 16:26:45

SAN JOSE, Calif., Dec. 19, 2012 /PRNewswire/ -- Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today announced that it has acquired the assets of Cambridge Nanotech, Inc. (Cambridge). Based in Cambridge, Mass., Cambridge was a leader in atomic layer deposition (ALD) solutions with hundreds of system installations in research and manufacturing settings...

2012-12-18 20:20:21

ESPOO, Finland, December 18, 2012 /PRNewswire/ -- Picosun Oy, leading atomic layer deposition (ALD) equipment manufacturer announces the launch of new Picofloat(TM) particle coating system. The new design will further complement Picosun's versatile ALD equipment range and make thin film coatings on powder and particle samples even easier than before. Powder materials form the basis of a huge number of industrial products, catalysts for chemistry and biochemistry, solid...

2012-11-19 00:20:49

ESPOO, Finland, November 19, 2012 /PRNewswire/ -- Picosun Oy, leading Atomic Layer Deposition (ALD) equipment manufacturer expands its product portfolio by introducing new, innovative Picosun(TM) roll-to-roll ALD coating system (patent pending). The demand for continuous ALD processing stems from the fields of flexible, printed electronics, OLED lighting, third generation thin film photovoltaic devices, high energy density thin film batteries, smart textiles, organic...

2012-11-05 00:21:32

ESPOO, Finland, and SUZHOU, China, November 5, 2012 /PRNewswire/ -- Picosun Oy, the leading Atomic Layer Deposition (ALD) equipment manufacturer is joining the China-Finland Nano Innovation Center, opened 2nd November, 2012 by the honourable guests of H.E. Mr. Wan Gang, China's Minister of Science and Technology, and H.E. Mr. Jyri Hakamies, Finland's Minister of Economic Affairs. The center, located in the city of Suzhou, Jiangsu Province in the Eastern China, was initiated by...

2012-10-16 15:20:50

ESPOO, Finland, and SHANGHAI, China, October 16, 2012 /PRNewswire/ -- Picosun Oy, leading atomic layer deposition (ALD) equipment manufacturer has co-organized the 1st International Conference on ALD Applications and 2nd China ALD Conference in cooperation with Fudan University, one of China's top universities. The event took place in Shanghai 15th - 16th October at Fudan University's premises. The Conference Committee was co-chaired by Prof. David Wei Zhang, Dean of...

2012-09-06 02:26:00

RED BANK, N.J., Sept. 6, 2012 /PRNewswire/ -- Dr. David H. Levy, the recipient of a PhD in Chemical Engineering from MIT who invented the atmospheric Spatial Atomic Layer Deposition process (SALD), has joined Natcore Technology Inc. (TSX-V: NXT; NTCXF.PK) as Director of Research & Technology. Dr. Levy brings 20 years of industrial R&D experience with vapor/vacuum coating, nanoparticle synthesis and dispersions, liquid coating, circuits and electronic devices to Natcore, a...

2012-08-30 14:26:03

ESPOO, Finland, August 30, 2012 /PRNewswire/ -- Picosun Oy, Finnish, globally operating manufacturer of top-quality Atomic Layer Deposition (ALD) systems reports excellent deposition results with its new Picoflow(TM) diffusion enhancer feature. At customer sites in Asia and Europe, ultra-high conformality and uniformity ALD metal oxide thin films were deposited on extremely challenging high aspect ratio (HAR) trenches on silicon wafers and complicated microchannel structures...