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Last updated on April 18, 2014 at 6:20 EDT

Latest D2S Inc. Stories

2013-09-09 12:31:35

SAN JOSE, Calif., Sept. 9, 2013 /PRNewswire/ -- D2S®, a supplier of computational design platforms, today announced that it has extended its partnership with NuFlare Technology, a world leader in electron beam (eBeam) mask writing systems, to accelerate the deployment of eBeam technologies that reduce write times and improve the accuracy of advanced photomasks for future design nodes leveraging general purpose graphic processing unit (GPGPU) acceleration. As part of this agreement,...

2012-09-11 06:31:29

SAN JOSE, Calif., Sept. 11, 2012 /PRNewswire/ -- D2S®, a supplier of computational design platforms, today unveiled TrueMask(TM) MDP--the first and only model-based mask data preparation (MB-MDP) solution to offer fully automated, full-chip mask data preparation for complex photomasks with Manhattanized, curvilinear and ideal inverse lithography technology (ILT) shapes within practical, cost-effective write-times. Developed to address complex mask designs at 20-nm-and-below process...

2012-09-04 06:31:11

SAN JOSE, Calif., Sept. 4, 2012 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced that several of its members will present the latest eBeam breakthroughs in mask technologies at the SPIE/BACUS Photomask Technology Symposium. The collaborative results demonstrate significant progress in meeting several key milestones outlined in the eBeam Initiative...

2012-02-13 11:00:00

SAN JOSE, Calif., Feb. 13, 2012 /PRNewswire/ -- D2S®, a supplier of computational design platforms, today announced that it has bolstered its management team with the hiring of three semiconductor industry veterans with deep business and technology expertise in electron beam (eBeam), photomask and lithography technology. Sterling Watson has joined D2S as vice president of engineering, Anthony Adamov has joined the company as vice president of business development, and Ryan...

2011-09-20 11:00:00

SAN JOSE, Calif., Sept. 20, 2011 /PRNewswire/ -- D2S(TM), a supplier of computational design platforms, today introduced TrueMask(TM) DS, the industry's first mask-wafer double simulation accelerated workstation for R&D exploration, bit-cell design, hot-spot analysis and mask-defect categorization that comprehends overlapping eBeam shots and dose modulation. TrueMask DS is an essential tool for mask shops and wafer fabs in qualifying and optimizing 20-nm-node and below designs, where...

2011-09-12 11:00:00

SAN JOSE, Calif., Sept. 12, 2011 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced that several of its members will present the latest eBeam breakthroughs in mask and direct write technologies at the SPIE/BACUS Photomask Symposium 2011--a worldwide technical conference and exhibition for the photomask industry. The collaborative results...

2011-03-29 11:00:00

SAN JOSE, Calif., March 29, 2011 /PRNewswire/ -- D2S(TM), an emerging supplier of computational design platforms, today announced that it has hired Stephen Meier as vice president of engineering. A 24-year veteran of the semiconductor industry with senior management stints at Intel and Synopsys, Meier will lead D2S' engineering team in developing the company's model-based mask data preparation (MB-MDP) technology. MB-MDP is a design for e-beam (DFEB) approach that uses overlapping...

2011-03-01 14:30:00

SAN JOSE, Calif., March 1, 2011 /PRNewswire/ -- Fellow eBeam Initiative members D2S(TM), an emerging supplier of computational design platforms, and NuFlare Technology, Inc., a world leader in electron beam mask writing systems, today announced a partnership to provide a D2S option for the NuFlare EBM-7000 mask writing system. A new interface developed between NuFlare and D2S enables the overlapping of shots that was previously not allowed in NuFlare machines. Further, NuFlare today...

2010-05-25 11:00:00

SAN JOSE, Calif., May 25 /PRNewswire/ -- D2S(TM), an emerging supplier of computational design platforms, today announced that Aki Fujimura, chairman and CEO of the company, will participate in a 22-nm manufacturing panel during the 47th Design Automation Conference (DAC) at the Anaheim Convention Center in Anaheim, Calif. DAC is the world's leading technical conference and tradeshow covering the latest trends in electronic design and design automation, and will be held June 13-18. Aki...

2010-04-13 21:30:00

SAN JOSE, Calif., April 13 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced a partnership with fellow eBeam Initiative member JEOL Ltd. to provide a new mask data preparation (MDP) infrastructure that is optimized for JEOL's new JBX-3200MV mask writing system. JEOL, a world leader in electron optical equipment and instrumentation, will use D2S' patent-pending, model-based MDP technology for both variable-shaped beam (VSB) lithography and the...