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Latest Deep reactive-ion etching Stories

2014-07-07 08:31:14

Primo iDEA's(TM) unique design improves productivity, reduces risk of plasma-induced damage and helps lower fab CoO SHANGHAI and SAN FRANCISCO, July 7, 2014 /PRNewswire/ -- Advanced Micro-Fabrication Equipment Inc. (AMEC) today introduced the Primo Integrated Dual-Station Etch and plasma downstream Asher ( Primo iDEA(TM)), an industry-first semiconductor processing tool that integrates dual-station dielectric etch and photoresist strip chambers onto the same platform. Targeted for...

2014-04-11 04:20:25

DUBLIN, April 11, 2014 /PRNewswire/ -- Dublin - Research and Markets ( http://www.researchandmarkets.com/research/6sgn72/the_global_mems) has announced the addition of the "The Global MEMS Device, Equipment, and Materials Markets: Forecasts and Strategies for Vendors and Foundries" [http://www.researchandmarkets.com/research/6sgn72/the_global_mems ] report to their offering. (Logo: http://photos.prnewswire.com/prnh/20130307/600769 ) This vision of MEMS whereby...

2014-02-23 23:00:05

Tronics announces that it has successfully manufactured the first single chip 6DOF MEMS based on the breakthrough piezoresistive nanowire technology, licensed from CEA-Leti. This is a major step towards the industrialization of 6DOF and 9DOF products. Grenoble, France; Dallas, TX (PRWEB) February 24, 2014 One year after announcing the industrialization of CEA-Leti’s M&NEMS technologies, Tronics has successfully designed and manufactured the first batch of 6DOF MEMS chips, with 3...


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