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Last updated on April 17, 2014 at 17:30 EDT

Latest eBeam Initiative Stories

2013-09-09 12:31:29

Hitachi High-Technologies Joins eBeam Initiative SAN JOSE, Calif., Sept. 9, 2013 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced the completion of the second annual eBeam Initiative survey. 28 member companies from across the photomask supply chain participated in the survey. Participants provided their opinions on a variety of topics...

2012-02-13 11:00:00

SAN JOSE, Calif., Feb. 13, 2012 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced it will unveil its latest roadmap this week at the SPIE Advanced Lithography Symposium being held at the San Jose Convention Center in San Jose, Calif. The roadmap will identify key milestones to be met by the eBeam Initiative in the coming years to improve mask...

2011-03-01 14:30:00

SAN JOSE, Calif., March 1, 2011 /PRNewswire/ -- Fellow eBeam Initiative members D2S(TM), an emerging supplier of computational design platforms, and NuFlare Technology, Inc., a world leader in electron beam mask writing systems, today announced a partnership to provide a D2S option for the NuFlare EBM-7000 mask writing system. A new interface developed between NuFlare and D2S enables the overlapping of shots that was previously not allowed in NuFlare machines. Further, NuFlare today...

2010-04-13 21:30:00

SAN JOSE, Calif., April 13 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced a partnership with fellow eBeam Initiative member JEOL Ltd. to provide a new mask data preparation (MDP) infrastructure that is optimized for JEOL's new JBX-3200MV mask writing system. JEOL, a world leader in electron optical equipment and instrumentation, will use D2S' patent-pending, model-based MDP technology for both variable-shaped beam (VSB) lithography and the...

2010-04-13 21:30:00

SAN JOSE, Calif., April 13 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in design-for-e-beam (DFEB) mask technology at Photomask Japan 2010--one of the world's premier symposia for advanced lithography mask technology. The joint proof points demonstrate the progress and...

2009-11-09 11:00:00

SAN JOSE, Calif., Nov. 9 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced the availability of DFEB methodology guidelines and training sessions for physical design engineers, which will be made available to members and non-members. DFEB is a design-to-manufacturing approach to enhance the throughput of e-beam (EB) lithographic exposure. During 2009, eBeam...