Latest eBeam Initiative Stories
SAN JOSE, Calif., March 1, 2011 /PRNewswire/ -- Fellow eBeam Initiative members D2S(TM), an emerging supplier of computational design platforms, and NuFlare Technology, Inc., a world leader in electron beam mask writing systems, today announced a partnership to provide a D2S option for the NuFlare EBM-7000 mask writing system.
SAN JOSE, Calif., April 13 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced a partnership with fellow eBeam Initiative member JEOL Ltd. to provide a new mask data preparation (MDP) infrastructure that is optimized for JEOL's new JBX-3200MV mask writing system.
SAN JOSE, Calif., April 13 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in design-for-e-beam (DFEB) mask technology at Photomask Japan 2010--one of the world's premier symposia for advanced lithography mask technology.
SAN JOSE, Calif., Nov.
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