Latest Electron beam lithography Stories
SAN JOSE, Calif., Sept. 4, 2012 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced that several of its members will present the latest eBeam breakthroughs in mask technologies at the SPIE/BACUS Photomask Technology Symposium. The collaborative results demonstrate significant progress in meeting several key milestones outlined in the eBeam...
SAN JOSE, Calif., Feb. 13, 2012 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced it will unveil its latest roadmap this week at the SPIE Advanced Lithography Symposium being held at the San Jose Convention Center in San Jose, Calif. The roadmap will identify key milestones to be met by the eBeam Initiative in the coming years to improve...
ST. FLORIAN, Austria, Jan. 10, 2012 /PRNewswire/ -- EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that it has signed a joint-development and licensing agreement with Eulitha AG, a pioneer and leader in the production of high-quality nanostructures using advanced lithography techniques. EVG will integrate Eulitha's PHABLE(TM) mask-based ultraviolet (UV) photolithography technology...
SAN JOSE, Calif., Sept. 12, 2011 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced that several of its members will present the latest eBeam breakthroughs in mask and direct write technologies at the SPIE/BACUS Photomask Symposium 2011--a worldwide technical conference and exhibition for the photomask industry. The collaborative results demonstrate...
In the quest to exploit unique properties at the nanoscale, scientists at Stevens Institute of Technology have developed a novel technique for creating uniform arrays of metallic nanostructures. A team of faculty and students in the Department of Physics and Engineering Physics, led by Dr. Stefan Strauf, appropriated methods from holographic lithography to demonstrate a new approach for scaling up the fabrication of plasmonic nanogap arrays while simultaneously reducing costs and...
Elionix, Inc., a world leader in electron beam lithography, announces a second order placed by Harvard's Center for Nanoscale Systems for the Elionix ELS-F125 electron beam lithography system. North Billerica, MA (PRWEB) May 31, 2011 Harvard's Center for Nanoscale Systems (CNS) has recently acquired the world's first 125kV electron beam lithography system to be installed in the United States. This system will be the most advanced instrument in its class for nanoscale patterning....
SAN JOSE, Calif., Feb. 22, 2011 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will present the latest breakthroughs in DFEB mask and direct write technology at the Annual SPIE Advanced Lithography Symposium 2011. In the area of DFEB mask, for example, the collaborative results demonstrate the effectiveness of DFEB technology in...
SAN JOSE, Calif., Sept. 7 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in DFEB mask technology at the Annual SPIE/BACUS Symposium 2010--a worldwide technical conference and exhibition and premier event for the photomask industry. The collaborative results demonstrate the effectiveness...
Pens that write with light offer low-cost, rapid nanofabrication capabilitiesOne Chicago skyline is dazzling enough. Now imagine 15,000 of them.A Northwestern University research team has done just that -- drawing 15,000 identical skylines with tiny beams of light using an innovative nanofabrication technology called beam-pen lithography (BPL).Details of the new method, which could do for nanofabrication what the desktop printer has done for printing and information transfer, will be...
ZURICH and SAN JOSE, Calif., April 23 /PRNewswire-FirstCall/ -- IBM (NYSE: IBM) scientists have created a 3D map of the earth so small that 1,000 of them could fit on one grain of salt.* The scientists accomplished this through a new, breakthrough technique that uses a tiny, silicon tip with a sharp apex -- 100,000 times smaller than a sharpened pencil -- to create patterns and structures as small as 15 nanometers at greatly reduced cost and complexity. This patterning technique opens new...
