Latest Electron beam lithography Stories
An interdisciplinary research team at the University of Illinois has developed a novel, tunable nanoantenna that paves the way for new kinds of plasmonic-based optomechanical systems whereby plasmonic field enhancement can actuate mechanical motion.
Sage Design Automation becomes latest company to join eBeam Initiative SAN JOSE, Calif., Feb.
In the quest to exploit unique properties at the nanoscale, scientists at Stevens Institute of Technology have developed a novel technique for creating uniform arrays of metallic nanostructures.
Elionix, Inc., a world leader in electron beam lithography, announces a second order placed by Harvardâ€™s Center for Nanoscale Systems for the Elionix ELS-F125 electron beam lithography system. North Billerica, MA (PRWEB) May 31, 2011 Harvardâ€™s Center for Nanoscale Systems (CNS) has recently acquired the worldâ€™s first 125kV electron beam lithography system to be installed in the United States.
SAN JOSE, Calif., Feb.