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Latest Electron beam lithography Stories

pillar-based Au bowtie nanoantenna arrays
2014-07-15 05:41:58

University of Illinois An interdisciplinary research team at the University of Illinois has developed a novel, tunable nanoantenna that paves the way for new kinds of plasmonic-based optomechanical systems whereby plasmonic field enhancement can actuate mechanical motion. “Recently, there has been a lot of interest in fabricating metal-based nanotextured surfaces that are pre-programmed to alter the properties of light in a specific way after incoming light interacts with it,”...

2014-02-25 12:31:12

Sage Design Automation becomes latest company to join eBeam Initiative SAN JOSE, Calif., Feb. 25, 2014 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced the top educational themes that it will highlight in 2014. These themes, which were identified based on member company feedback to the Initiative's most recent annual survey completed late...

2011-09-06 22:39:24

In the quest to exploit unique properties at the nanoscale, scientists at Stevens Institute of Technology have developed a novel technique for creating uniform arrays of metallic nanostructures. A team of faculty and students in the Department of Physics and Engineering Physics, led by Dr. Stefan Strauf, appropriated methods from holographic lithography to demonstrate a new approach for scaling up the fabrication of plasmonic nanogap arrays while simultaneously reducing costs and...

2011-06-01 00:06:50

Elionix, Inc., a world leader in electron beam lithography, announces a second order placed by Harvard's Center for Nanoscale Systems for the Elionix ELS-F125 electron beam lithography system. North Billerica, MA (PRWEB) May 31, 2011 Harvard's Center for Nanoscale Systems (CNS) has recently acquired the world's first 125kV electron beam lithography system to be installed in the United States. This system will be the most advanced instrument in its class for nanoscale patterning. Through...

2011-02-22 11:00:00

SAN JOSE, Calif., Feb. 22, 2011 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will present the latest breakthroughs in DFEB mask and direct write technology at the Annual SPIE Advanced Lithography Symposium 2011. In the area of DFEB mask, for example, the collaborative results demonstrate the effectiveness of DFEB technology in...


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ramage
  • Boughs or branches.
  • Warbling of birds in trees.
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