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Last updated on April 20, 2014 at 17:20 EDT

Latest Ellipsometry Stories

2014-04-10 04:20:14

Including a Distinctive Portable TypeChigasaki, Kanagawa, Japan, Apr 10 - Top: UNECS-Portable; Down: It can be used with the stage detachedChigasaki, Kanagawa, Japan, Apr 10, 2014 - (ACN Newswire) - ULVAC, Inc. (Headquarters: Chigasaki, Kanagawa, Japan; President and CEO: Hisaharu Obinata; hereafter referred to as ULVAC) is pleased to announce that five new products are released in addition to the current product line, which can measure thicknesses and optical coefficients of thin films at a...

2011-09-05 04:20:01

'UNECS-3000A' Dramatically Improved Performance Through an Automatic High-Speed Mapping Function Chigasaki, Japan, Sept 5, 2011 - (JCN Newswire) - ULVAC, Inc. is pleased to announce that it has developed and will begin sale of the "UNECS-3000A" Spectroscopic Ellipsometer, which can measure the thinness of a thin film and optical constant.BackgroundA spectroscopic ellipsometer is a high-precision measurement instrument that uses the principal of ellipsometry to...

2011-06-16 06:00:00

MIGDAL HA'EMEK, Israel, June 16, 2011 /PRNewswire/ -- Jordan Valley Semiconductors Ltd., a leading provider of X-ray metrology solutions for advanced semiconductor fabs, announced today the delivery of a follow-on order of its JVX7200 and JVX6200 thin-film metrology systems for a major foundry in the Far East. "This repeat order clearly shows the customer's confidence in our system's enabling capabilities and production worthiness," said Mr. Isaac Mazor, Jordan Valley...

2010-08-04 15:15:00

MILPITAS, Calif., Aug. 4 /PRNewswire-FirstCall/ -- Today KLA-Tencor Corporation (Nasdaq: KLAC), the world's leading supplier of process control and yield management solutions for the semiconductor and related industries, introduced the latest addition to the Aleris family of film metrology tools. The Aleris 8330 is a reliable, production worthy, low cost of ownership metrology solution for measuring thickness, refractive index and stress of non-critical* films at the 32nm node and beyond,...