Latest EUV Litho Inc. Stories
Increasingly powerful plasma source based scanners that could be enhanced with optical innovations and improved resists are driving extreme ultraviolet lithography (EUVL) closer to manufacturability, according to technologists at a recently concluded EUVL R&D forum here. The 2008 International Workshop on EUV Lithography, held June 10-12 at the Wailea Beach Marriott, brought together lithographers from North America, Europe and Asia for a multi-disciplinary look at new solutions for the...
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