Latest Extreme ultraviolet lithography Stories
BILLERICA, Mass., May 4, 2015 /PRNewswire/ -- SEMATECH and Exogenesis Corp.
New spin-on hardmask materials -- SAP-100 product line -- enables most advanced semiconductor nodes as well as process simplifications HELSINKI, Finland, April 1, 2015 /PRNewswire/
ZUG, Switzerland, Oct.
Continued semiconductor scaling drives new mask design requirements; use of complex mask shapes predicted to increase SAN JOSE, Calif., Sept.
A Berkeley Lab-Intel collaboration outlines the chemistry of photoresist, enabling smaller features for future generations of microprocessors.
GEMINI®FB XT surpasses ITRS requirements for wafer bonding with up to 3X improvement in wafer-to-wafer alignment; enhanced productivity enables 50 percent increased throughput ST.
Merger creates an independent spin out company that will focus on developing nanotechnology market opportunities AUSTIN, Texas, Feb.
Experiments may help in the design of new sources of extreme ultraviolet light for making integrated circuits with next generation lithography
- Stoppage; cessation (of labor).
- A standing still or idling (of mills, factories, etc.).