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Latest Extreme ultraviolet lithography Stories

2014-10-22 08:40:25

ZUG, Switzerland, Oct. 22, 2014 /PRNewswire/ -- Adlyte Inc., a developer of high-brightness extreme light sources for advanced semiconductor inspection and metrology applications, today announced it has reached a key performance benchmark for its extreme ultraviolet (EUV) light source for high-volume manufacturing (HVM)-readiness. Adlyte has demonstrated that its EUV light source has maintained clean operation after intermediate focus while running for hundreds of hours replicating...

2014-09-16 12:36:00

Continued semiconductor scaling drives new mask design requirements; use of complex mask shapes predicted to increase SAN JOSE, Calif., Sept. 16, 2014 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced the completion of its third annual eBeam Initiative survey. 52 industry luminaries representing 29 member companies from across the photomask supply...

2014-07-17 16:06:47

Berkeley Lab A Berkeley Lab-Intel collaboration outlines the chemistry of photoresist, enabling smaller features for future generations of microprocessors. Over the years, computer chips have gotten smaller thanks to advances in materials science and manufacturing technologies. This march of progress, the doubling of transistors on a microprocessor roughly every two years, is called Moore’s Law. But there’s one component of the chip-making process in need of an overhaul if...

2014-06-30 08:37:09

GEMINI®FB XT surpasses ITRS requirements for wafer bonding with up to 3X improvement in wafer-to-wafer alignment; enhanced productivity enables 50 percent increased throughput ST. FLORIAN, Austria, June 30, 2014 /PRNewswire/ -- EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today unveiled the GEMINI(®)FB XT--its next-generation fusion wafer bonding platform, which combines several performance...

2014-02-13 16:30:29

Merger creates an independent spin out company that will focus on developing nanotechnology market opportunities AUSTIN, Texas, Feb. 13, 2014 /PRNewswire/ -- Molecular Imprints Inc. (MII), the market and technology leader for nanopatterning systems and solutions, today announced it has signed an agreement to sell its semiconductor imprint lithography equipment business to Canon Inc. of Tokyo, Japan. Canon currently manufactures and markets KrF excimer and i-line illumination optical...

Taking Ultraviolet Light To The extreme
2013-10-04 12:17:25

American Institute of Physics Experiments may help in the design of new sources of extreme ultraviolet light for making integrated circuits with next generation lithography When you heat a tiny droplet of liquid tin with a laser, plasma forms on the surface of the droplet and produces extreme ultraviolet (EUV) light, which has a higher frequency and greater energy than normal ultraviolet. Now, for the first time, researchers have mapped this EUV emission and developed a theoretical...


Word of the Day
negawatt
  • A unit of saved energy.
Coined by Amory Lovins, chairman of the Rocky Mountain Institute as a contraction of negative watt on the model of similar compounds like megawatt.