Latest Extreme ultraviolet lithography Stories
SAN DIEGO, Jan. 12, 2011 /PRNewswire/ -- Cymer, Inc. (Nasdaq: CYMI), the world's leading supplier of light sources used by chipmakers to create advanced semiconductor chips, today announced that the company will provide a live audio webcast with a slide presentation on Wednesday, February 2, 2011 at 2:00 p.m. PST to discuss fourth quarter and 2010 operating results and current company developments. The live webcast will be available on the Investor Relations page of Cymer's website at...
The manufacturing of semiconductor wafers used in all types of electronics involves etching small features onto a wafer with lasers, a process that is ultimately limited by the wavelength of the light itself. The semiconductor industry is rapidly approaching this fundamental limit for increasing the speed of the microchip. The development of a new intense 13.5-nm (extreme ultraviolet or EUV) light source will resolve this issue by reducing the feature size by an order of magnitude or so,...
SAN DIEGO, July 14 /PRNewswire-FirstCall/ -- Cymer, Inc. (Nasdaq: CYMI), the market's leading developer of light sources used to pattern advanced semiconductor chips, announced today the introduction of the ELS(TM) 7010x, the world's first field-selectable 30 to 50 watt (W) Krypton Fluoride (KrF) light source. The ELS 7010x allows customers to easily adjust power from 30W to 50W based on changing wafer design requirements and production needs. An extension of Cymer's highly reliable ELS...
SAN DIEGO, May 24 /PRNewswire-FirstCall/ -- Cymer, Inc. (Nasdaq: CYMI), the world's leading supplier of light sources used by chipmakers to create advanced semiconductor chips, today announced the opening of a Silicon Valley office, located in Santa Clara, Calif. With the expansion, Cymer will have direct access to the extensive talent pool at several respected global technology companies and from the area's highly regarded universities. "Our new multi-functional Silicon Valley office is...
KAWASAKI, Japan, April 26 /PRNewswire/ --Technology consortium, the Extreme Ultraviolet Lithography System Development Association (EUVA), today announced that its extreme ultraviolet (EUV) light source has achieved a power output of 104 Watts at the intermediate focus (IF), at which EUV is effectively radiated. Supported by the New Energy and Industrial Technology Development Organization (NEDO), the EUVA has been working on the development of laser produced plasma (LPP) light sources for...
OYAMA, Japan, April 26 /PRNewswire/ -- Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced that an extreme ultraviolet (EUV) light source developed by the technology consortium Extreme Ultraviolet Lithography System Development Association has achieved the world's highest output--104 Watts. Today's milestone marks an industry first and signals a significant step forward in the realization of the first volume-production-worthy...
SAN JOSE, Calif., April 13 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in design-for-e-beam (DFEB) mask technology at Photomask Japan 2010--one of the world's premier symposia for advanced lithography mask technology. The joint proof points demonstrate the progress and effectiveness...
Our world is full of integrated semiconductor circuits, commonly known as microchips. Today you find them in computers, cars, mobile phones and in almost every electrical device. Technology from ESA's XMM-Newton space telescope will make these chips much smaller, faster and cheaper.The circuits are etched into today's microchips by ultraviolet light.The demand for faster and more powerful chips requires the use of extreme ultraviolet (EUV). Much smaller semiconductor circuits can be produced,...
VELDHOVEN, Netherlands and HSINCHU, Taiwan, R.O.C., Feb. 21 /PRNewswire-FirstCall/ -- ASML Holding NV (ASML) today announced that Taiwan Semiconductor Manufacturing Company (TWSE: 2330, NYSE: TSM) will take delivery of a TWINSCAN NXE:3100 extreme ultra-violet (EUV) lithography system. This tool represents one of six NXE:3100 EUV systems for ASML's worldwide partners and customers. TSMC is expected to be the first dedicated foundry conducting on-site EUV development and will install the new...
MILPITAS, Calif., Feb. 18 /PRNewswire-FirstCall/ -- Today KLA-Tencor Corporation (Nasdaq: KLAC), the world's leading supplier of process control and yield management solutions for the semiconductor and related industries, introduced the latest generation of their PROLITH virtual lithography tool. PROLITH X3.1 enables researchers at leading-edge chipmakers, consortia and equipment makers to quickly and cost-effectively troubleshoot challenging issues in EUV and double patterning lithography...
