Latest Extreme ultraviolet lithography Stories
SAN DIEGO, July 14 /PRNewswire-FirstCall/ -- Cymer, Inc.
SAN DIEGO, May 24 /PRNewswire-FirstCall/ -- Cymer, Inc. (Nasdaq: CYMI), the world's leading supplier of light sources used by chipmakers to create advanced semiconductor chips, today announced the opening of a Silicon Valley office, located in Santa Clara, Calif.
KAWASAKI, Japan, April 26 /PRNewswire/ --Technology consortium, the Extreme Ultraviolet Lithography System Development Association (EUVA), today announced that its extreme ultraviolet (EUV) light source has achieved a power output of 104 Watts at the intermediate focus (IF), at which EUV is effectively radiated.
OYAMA, Japan, April 26 /PRNewswire/ -- Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced that an extreme ultraviolet (EUV) light source developed by the technology consortium Extreme Ultraviolet Lithography System Development Association has achieved the world's highest output--104 Watts.
SAN JOSE, Calif., April 13 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in design-for-e-beam (DFEB) mask technology at Photomask Japan 2010--one of the world's premier symposia for advanced lithography mask technology.
Our world is full of integrated semiconductor circuits, commonly known as microchips.
VELDHOVEN, Netherlands and HSINCHU, Taiwan, R.O.C., Feb. 21 /PRNewswire-FirstCall/ -- ASML Holding NV (ASML) today announced that Taiwan Semiconductor Manufacturing Company (TWSE: 2330, NYSE: TSM) will take delivery of a TWINSCAN NXE:3100 extreme ultra-violet (EUV) lithography system.
MILPITAS, Calif., Feb. 18 /PRNewswire-FirstCall/ -- Today KLA-Tencor Corporation (Nasdaq: KLAC), the world's leading supplier of process control and yield management solutions for the semiconductor and related industries, introduced the latest generation of their PROLITH virtual lithography tool.
The Special Sensor Ultraviolet Limb Imager (SSULI) developed by NRL's Spacecraft Engineering Department and Space Science Division, launched October 18, 2009 on the US Air Force Defense Meteorological Satellite Program (DMSP) F18 (flight 18) satellite, observed first light on December 1, 2009.
Researchers are adapting the same methods used in fusion-energy research to create extremely thin plasma beams for a new class of "nanolithography" required to make future computer chips.
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