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Latest Extreme ultraviolet lithography Stories

2010-04-26 12:18:00

KAWASAKI, Japan, April 26 /PRNewswire/ --Technology consortium, the Extreme Ultraviolet Lithography System Development Association (EUVA), today announced that its extreme ultraviolet (EUV) light source has achieved a power output of 104 Watts at the intermediate focus (IF), at which EUV is effectively radiated. Supported by the New Energy and Industrial Technology Development Organization (NEDO), the EUVA has been working on the development of laser produced plasma (LPP) light sources...

2010-04-26 12:09:00

OYAMA, Japan, April 26 /PRNewswire/ -- Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced that an extreme ultraviolet (EUV) light source developed by the technology consortium Extreme Ultraviolet Lithography System Development Association has achieved the world's highest output--104 Watts. Today's milestone marks an industry first and signals a significant step forward in the realization of the first volume-production-worthy...

2010-04-13 21:30:00

SAN JOSE, Calif., April 13 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in design-for-e-beam (DFEB) mask technology at Photomask Japan 2010--one of the world's premier symposia for advanced lithography mask technology. The joint proof points demonstrate the progress and...

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2010-03-24 08:00:00

Our world is full of integrated semiconductor circuits, commonly known as microchips. Today you find them in computers, cars, mobile phones and in almost every electrical device. Technology from ESA's XMM-Newton space telescope will make these chips much smaller, faster and cheaper. The circuits are etched into today's microchips by ultraviolet light. The demand for faster and more powerful chips requires the use of extreme ultraviolet (EUV). Much smaller semiconductor circuits can be...

2010-02-21 18:30:00

VELDHOVEN, Netherlands and HSINCHU, Taiwan, R.O.C., Feb. 21 /PRNewswire-FirstCall/ -- ASML Holding NV (ASML) today announced that Taiwan Semiconductor Manufacturing Company (TWSE: 2330, NYSE: TSM) will take delivery of a TWINSCAN NXE:3100 extreme ultra-violet (EUV) lithography system. This tool represents one of six NXE:3100 EUV systems for ASML's worldwide partners and customers. TSMC is expected to be the first dedicated foundry conducting on-site EUV development and will install the...

2010-02-18 15:15:00

MILPITAS, Calif., Feb. 18 /PRNewswire-FirstCall/ -- Today KLA-Tencor Corporation (Nasdaq: KLAC), the world's leading supplier of process control and yield management solutions for the semiconductor and related industries, introduced the latest generation of their PROLITH virtual lithography tool. PROLITH X3.1 enables researchers at leading-edge chipmakers, consortia and equipment makers to quickly and cost-effectively troubleshoot challenging issues in EUV and double patterning...

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2009-12-02 14:25:00

The Special Sensor Ultraviolet Limb Imager (SSULI) developed by NRL's Spacecraft Engineering Department and Space Science Division, launched October 18, 2009 on the U.S. Air Force Defense Meteorological Satellite Program (DMSP) F18 (flight 18) satellite, observed first light on December 1, 2009. In a sample airglow profile the spectral emission features in the data are clean and show no anomalies. "The SSULI team is very excited to continue with early orbit testing and begin the calibration...

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2009-08-18 16:40:00

Researchers are adapting the same methods used in fusion-energy research to create extremely thin plasma beams for a new class of "nanolithography" required to make future computer chips.Current technology uses ultraviolet light to create the fine features in computer chips in a process called photolithography, which involves projecting the image of a mask onto a light-sensitive material, then chemically etching the resulting pattern.New nanolithography will be needed to continue advances in...

2009-08-18 12:52:22

U.S. scientists say they're using a fusion-energy research method to create extremely thin plasma beams for a new class of nanolithography. The Purdue University researchers say a new class of nanolithography is needed to make future computer chips We can't make devices much smaller using conventional lithography, so we have to find ways of creating beams having more narrow wavelengths, said Professor Ahmed Hassanein. He said the new plasma-based lithography under development generates...

2009-07-21 10:00:00

SAN DIEGO, July 21 /PRNewswire-FirstCall/ -- Cymer, Inc. (Nasdaq: CYMI), the market's leading developer of light sources used to pattern advanced semiconductor chips, announced today that the world's first field-selectable 60 watt-90 watt (W) immersion light source--the XLR 600ix--has been integrated into a Nikon scanner, and successfully installed at a large Asian chipmaker. This milestone represents the first immersion light source of this kind to be installed at a major chipmaker, and...


Word of the Day
call-note
  • The call or cry of a bird or other animal to its mate or its young.
'Call-note' is newer than 'bird-call,' which originally referred to 'an instrument for imitating the note of birds' but now also refers to 'the song or cry of a bird.'
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