Latest Extreme Ultraviolet Stories
Researchers are adapting the same methods used in fusion-energy research to create extremely thin plasma beams for a new class of "nanolithography" required to make future computer chips.
WOBURN, Mass., July 20 /PRNewswire/ -- Energetiq Technology, Inc., a developer and manufacturer of specialized short-wavelength light products for advanced technology applications, has been given an Outstanding Contribution Award at the 2009 International Workshop for EUV Lithography, for excellent performance of the Energetiq EUV light source and the company's contribution to EUVL development.
Ultrafast laser research at Kansas State University has allowed physicists to build on Nobel Prize-winning work in photo-electronics by none other than Albert Einstein.
With extremely short wavelengths and very high intensities, light-matter interaction seems to be different than previously accepted
10 kHz Source Enables High Volume Manufacturing (HVM) Simulation WOBURN, Mass., Feb.
Exposing silicon wafers to light during chip manufacture requires special fixtures called chucks. Novel electrostatic chucks made of glass ceramics are incredibly flat. This prevents structural distortions on the exposure mask and the silicon chip.
Increasingly powerful plasma source based scanners that could be enhanced with optical innovations and improved resists are driving extreme ultraviolet lithography (EUVL) closer to manufacturability, according to technologists at a recently concluded EUVL R&D forum here.
Extreme ultraviolet lithography (EUVL) may be the next-generation patterning technique used to produce smaller and faster microchips with feature sizes of 32 nanometers and below. However, durable projection optics must be developed before this laboratory technique can become commercially viable. As part of its long-standing effort to develop EUVL metrology and calibration services (summarized in a recent paper*), the National Institute of Standards and Technology (NIST) is creating a...
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