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Latest Extreme Ultraviolet Stories

2009-08-18 12:52:22

U.S. scientists say they're using a fusion-energy research method to create extremely thin plasma beams for a new class of nanolithography. The Purdue University researchers say a new class of nanolithography is needed to make future computer chips We can't make devices much smaller using conventional lithography, so we have to find ways of creating beams having more narrow wavelengths, said Professor Ahmed Hassanein. He said the new plasma-based lithography under development generates...

2009-07-20 05:00:00

WOBURN, Mass., July 20 /PRNewswire/ -- Energetiq Technology, Inc., a developer and manufacturer of specialized short-wavelength light products for advanced technology applications, has been given an Outstanding Contribution Award at the 2009 International Workshop for EUV Lithography, for excellent performance of the Energetiq EUV light source and the company's contribution to EUVL development. Only two awards were given at the Workshop held last week in Honolulu, Hawaii -- the one to...

2009-05-21 12:57:24

Ultrafast laser research at Kansas State University has allowed physicists to build on Nobel Prize-winning work in photo-electronics by none other than Albert Einstein. Einstein received the Nobel Prize in 1921 for his theoretical explanation in 1905 of the so-called photo-effect -- that is, the emission of electrons from a metal surface by incident light. In Einstein's time, laboratory light sources provided light of very low intensity in comparison with modern lasers like those at K-State....

2009-04-24 14:30:51

With extremely short wavelengths and very high intensities, light-matter interaction seems to be different than previously accepted By way of the classical photoeffect, Einstein proved in 1905 that light also has particle character. However, with extremely high light intensities, remarkable things happen in the process. Scientists of the Physikalisch-Technische Bundesanstalt (PTB) have found this out with colleagues at FLASH in Hamburg, the first free-electron laser (FEL) for soft X-rays...

2009-02-23 07:00:00

10 kHz Source Enables High Volume Manufacturing (HVM) Simulation WOBURN, Mass., Feb. 23 /PRNewswire/ -- Energetiq Technology, Inc., a developer and manufacturer of specialized short-wavelength light products for advanced technology applications, announced today that it has developed a new EUV light source, the EQ-10HR that operates at a high pulse rate of 10 kHz to simulate the requirements of high volume manufacturing (HVM) for EUV lithography (EUVL) implementation. Energetiq will exhibit...

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2009-01-19 14:47:07

Exposing silicon wafers to light during chip manufacture requires special fixtures called chucks. Novel electrostatic chucks made of glass ceramics are incredibly flat. This prevents structural distortions on the exposure mask and the silicon chip. Smaller, even smaller, tiny. Miniaturization in chip manufacture is progressing at an impressive pace. Researchers continue to push the physical limits of semiconductor technology and are developing methods of making circuit elements even smaller...

2008-06-17 18:00:39

Increasingly powerful plasma source based scanners that could be enhanced with optical innovations and improved resists are driving extreme ultraviolet lithography (EUVL) closer to manufacturability, according to technologists at a recently concluded EUVL R&D forum here. The 2008 International Workshop on EUV Lithography, held June 10-12 at the Wailea Beach Marriott, brought together lithographers from North America, Europe and Asia for a multi-disciplinary look at new solutions for the...

2005-07-14 16:50:00

Extreme ultraviolet lithography (EUVL) may be the next-generation patterning technique used to produce smaller and faster microchips with feature sizes of 32 nanometers and below. However, durable projection optics must be developed before this laboratory technique can become commercially viable. As part of its long-standing effort to develop EUVL metrology and calibration services (summarized in a recent paper*), the National Institute of Standards and Technology (NIST) is creating a...


Word of the Day
siliqua
  • A Roman unit of weight, 1⁄1728 of a pound.
  • A weight of four grains used in weighing gold and precious stones; a carat.
  • In anatomy, a formation suggesting a husk or pod.
  • The lowest unit in the Roman coinage, the twenty-fourth part of a solidus.
  • A coin of base silver of the Gothic and Lombard kings of Italy.
'Siliqua' comes from a Latin word meaning 'a pod.'
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