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Last updated on April 18, 2014 at 1:21 EDT

Latest Mask data preparation Stories

2012-09-11 06:31:29

SAN JOSE, Calif., Sept. 11, 2012 /PRNewswire/ -- D2S®, a supplier of computational design platforms, today unveiled TrueMask(TM) MDP--the first and only model-based mask data preparation (MB-MDP) solution to offer fully automated, full-chip mask data preparation for complex photomasks with Manhattanized, curvilinear and ideal inverse lithography technology (ILT) shapes within practical, cost-effective write-times. Developed to address complex mask designs at 20-nm-and-below process...

2011-09-12 11:00:00

SAN JOSE, Calif., Sept. 12, 2011 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced that several of its members will present the latest eBeam breakthroughs in mask and direct write technologies at the SPIE/BACUS Photomask Symposium 2011--a worldwide technical conference and exhibition for the photomask industry. The collaborative results...

2010-04-13 21:30:00

SAN JOSE, Calif., April 13 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced a partnership with fellow eBeam Initiative member JEOL Ltd. to provide a new mask data preparation (MDP) infrastructure that is optimized for JEOL's new JBX-3200MV mask writing system. JEOL, a world leader in electron optical equipment and instrumentation, will use D2S' patent-pending, model-based MDP technology for both variable-shaped beam (VSB) lithography and the...