Latest Nanoimprint lithography Stories
Two new EVG®580 ComBond® system configurations address university / research & development and high-volume manufacturing needs respectively ST.
True to its reputation as a pioneer in special processes, Tronics is capitalizing on the growing number of submicronic MEMS devices opportunities to expand its equipment and process base.
Dedicated nanoimprint lithography (NIL) solutions to enable rapid development of NILPhotonics(TM) applications, feasibility studies and pilot-line production services for faster time to market
Jet and Flash® Imprint Lithography (J-FIL®) technology fabricates novel functional glass and films that enable higher quality displays for the consumer electronics market AUSTIN,
SmartNIL(TM) large-area soft nanoimprint lithography process for high-volume manufacturing provides unmatched throughput and cost-of-ownership advantages over competing NIL approaches ST.
EVG®580 ComBond® integrates advanced surface preparation processing to ensure oxide-free bonds and higher device yields ST. FLORIAN, Austria, Oct.
GEMINI®FB XT surpasses ITRS requirements for wafer bonding with up to 3X improvement in wafer-to-wafer alignment; enhanced productivity enables 50 percent increased throughput ST.
Unique anti-reflective materials combined with coating equipment and process expertise create 'total' AR coating solution to increase lumen output by up to eight percent SANTA CLARA,
Merger creates an independent spin out company that will focus on developing nanotechnology market opportunities AUSTIN, Texas, Feb.