Quantcast

Latest Nanolithography Stories

2012-08-02 08:20:01

Scientists from A*STAR's Institute of Materials Research and Engineering (IMRE) will partner companies to develop, prototype and conduct pilot large scale manufacturing of nanoimprinted materials with better performance and at potentially lower cost than current production methods.Singapore, Aug 2, 2012 - (ACN Newswire) - Fast, high-volume production of plastics with specially engineered surfaces will soon be available using a cheaper and simpler method. IMRE and its Industrial Consortium On...

2012-01-21 08:00:00

Heidelberg Instruments announced the sale of a DWL 200 maskless laser lithography system to the University of Minnesota Nanofabrication Center in Minneapolis, USA. (PRWEB) January 21, 2012 Heidelberg Instruments announced the sale of a DWL 200 maskless laser lithography system to the University of Minnesota Nanofabrication Center in Minneapolis, USA. The DWL 200 maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub...

Image 1 - Researchers Ink Nanostructures With Tiny Soldering Iron
2011-11-08 04:11:44

Researchers with the U.S. Department of Energy (DOE)´s Lawrence Berkeley National Laboratory (Berkeley Lab) have shed light on the role of temperature in controlling a fabrication technique for drawing chemical patterns as small as 20 nanometers.  This technique could provide an inexpensive, fast route to growing and patterning a wide variety of materials on surfaces to build electrical circuits and chemical sensors, or study how pharmaceuticals bind to proteins and viruses. One...

ee3f066c5c1c134df845988ac44201b3
2011-07-19 08:54:51

Writing nanostructures Using a technique known as thermochemical nanolithography (TCNL), researchers have developed a new way to fabricate nanometer-scale ferroelectric structures directly on flexible plastic substrates that would be unable to withstand the processing temperatures normally required to create such nanostructures. The technique, which uses a heated atomic force microscope (AFM) tip to produce patterns, could facilitate high-density, low-cost production of complex ferroelectric...

2011-06-01 00:06:50

Elionix, Inc., a world leader in electron beam lithography, announces a second order placed by Harvard's Center for Nanoscale Systems for the Elionix ELS-F125 electron beam lithography system. North Billerica, MA (PRWEB) May 31, 2011 Harvard's Center for Nanoscale Systems (CNS) has recently acquired the world's first 125kV electron beam lithography system to be installed in the United States. This system will be the most advanced instrument in its class for nanoscale patterning. Through...

2011-04-05 18:11:00

SAN JOSE, Calif., April 5, 2011 /PRNewswire/ -- Maskless Lithography, Inc., will showcase its new MLI-3000(TM) digital, direct-write imaging (DI) product at the upcoming IPC APEX Expo(TM) in Las Vegas April 12-14. Reflecting the "breakthrough" status of the technology, Maskless Lithography is one of only ten companies to be accepted into the IPC APEX Expo Innovation Technology Center where its new MLI-3000 product family will be featured throughout the show. A review board of industry...

2011-03-09 13:06:00

SAN JOSE, Calif., March 9, 2011 /PRNewswire/ -- Maskless Lithography, Inc., a leading supplier of digital imaging technologies to the global printed circuit board (PCB) industry, announced today that U.S. Circuits, Inc. has taken delivery of Maskless Lithography's innovative direct-write imaging systems (DI) at its Southern California facility. As the limitations of contact printing become increasingly apparent, particularly as the PCB industry approaches 50 micron feature sizes,...

2011-01-12 09:09:00

AUSTIN, Texas, Jan. 12, 2011 /PRNewswire/ -- Molecular Imprints, Inc., the market and technology leader for nanoimprint lithography systems and solutions, today introduced the Perfecta MR5000 -- its new Jet and Flash(TM) Imprint Lithography (J-FIL(TM)) imprint mask replication platform for the semiconductor industry. Representing the industry's first nanopatterning system specifically designed to replicate 6025 imprint masks, the Perfecta MR5000 enables multiple identical replica masks...

2010-10-13 10:56:00

COPENHAGEN, Denmark, Oct. 13 /PRNewswire/ -- NNT CONFERENCE -- EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today unveiled a new technology capability that enables ultra-high-resolution patterning of features down to 12.5 nm: Soft Molecular Scale Nanoimprint Lithography (SMS-NIL). Based on EVG's proven UV-NIL systems, SMS-NIL provides customers with a repeatable, cost-effective process for producing...


Word of the Day
bodacious
  • Remarkable; prodigious.
  • Audacious; gutsy.
  • Completely; extremely.
  • Audaciously; boldly.
  • Impressively great in size; enormous; extraordinary.
This word is probably from the dialectal 'boldacious,' a blend of 'bold' and 'audacious.'
Related