Latest Nanolithography Stories
Researchers from North Carolina State University have developed a new nanolithography technique that is less expensive than other approaches and can be used to create technologies with biomedical applications.
Scientists from A*STAR's Institute of Materials Research and Engineering (IMRE) will partner companies to develop, prototype and conduct pilot large scale manufacturing of nanoimprinted
Heidelberg Instruments announced the sale of a DWL 200 maskless laser lithography system to the University of Minnesota Nanofabrication Center in Minneapolis, USA. (PRWEB)
Researchers with Berkeley Lab have shed light on the role of temperature in controlling a fabrication technique for drawing chemical patterns as small as 20 nanometers.
Using a technique known as thermochemical nanolithography (TCNL), researchers have developed a new way to fabricate nanometer-scale ferroelectric structures directly on flexible plastic substrates that would be unable to withstand the processing temperatures normally required to create such nanostructures.
Elionix, Inc., a world leader in electron beam lithography, announces a second order placed by Harvardâ€™s Center for Nanoscale Systems for the Elionix ELS-F125 electron beam lithography system. North Billerica, MA (PRWEB) May 31, 2011 Harvardâ€™s Center for Nanoscale Systems (CNS) has recently acquired the worldâ€™s first 125kV electron beam lithography system to be installed in the United States.
SAN JOSE, Calif., April 5, 2011 /PRNewswire/ -- Maskless Lithography, Inc., will showcase its new MLI-3000(TM) digital, direct-write imaging (DI) product at the upcoming IPC APEX Expo(TM) in Las Vegas April 12-14.
SAN JOSE, Calif., March 9, 2011 /PRNewswire/ -- Maskless Lithography, Inc., a leading supplier of digital imaging technologies to the global printed circuit board (PCB) industry, announced today that U.S. Circuits, Inc.
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