Latest Nanolithography Stories
AUSTIN, Texas, Jan.
COPENHAGEN, Denmark, Oct.
ST. FLORIAN, Austria, Sept.
Singapore, Aug 3, 2010 - (ACN Newswire) - A*STAR's new 'Industrial Consortium On Nanoimprint', or 'ICON', encourages companies to adopt versatile, industry-ready nanoimprinting technology that allows new chemical and additive-free products for the market.ICON is a multi-agency effort with support from Singapore's leading trade and industry development bodies - Economic Development Board (EDB), International Enterprise (IE) Singapore and SPRING Singapore.
Low-cost nanopatterning method utilizes popular shrinkable plastic.
One Chicago skyline is dazzling enough. Now imagine 15,000 of them.
KAWASAKI, Japan, April 26 /PRNewswire/ --Technology consortium, the Extreme Ultraviolet Lithography System Development Association (EUVA), today announced that its extreme ultraviolet (EUV) light source has achieved a power output of 104 Watts at the intermediate focus (IF), at which EUV is effectively radiated.
OYAMA, Japan, April 26 /PRNewswire/ -- Gigaphoton Inc., a major lithography light source manufacturer for the global semiconductor industry, today announced that an extreme ultraviolet (EUV) light source developed by the technology consortium Extreme Ultraviolet Lithography System Development Association has achieved the world's highest output--104 Watts.
ZURICH and SAN JOSE, Calif., April 23 /PRNewswire-FirstCall/ -- IBM (NYSE: IBM) scientists have created a 3D map of the earth so small that 1,000 of them could fit on one grain of salt.* The scientists accomplished this through a new, breakthrough technique that uses a tiny, silicon tip with a sharp apex -- 100,000 times smaller than a sharpened pencil -- to create patterns and structures as small as 15 nanometers at greatly reduced cost and complexity.