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Last updated on April 16, 2014 at 6:17 EDT

Latest Photolithography Stories

2014-03-12 12:34:44

ST. FLORIAN, Austria, March 12, 2014 /PRNewswire/ -- EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that its patented NanoSpray conformal coating technology is now available on its newly introduced EVG150XT resist coating and developing system for high-volume manufacturing (HVM) semiconductor applications. NanoSpray provides conformal coating of structures that have vertical...

2014-03-10 04:21:49

PHOENIX, March 10, 2014 /PRNewswire/ -- FlipChip International - (FCI), the global technology leader in flip chip bumping and Wafer Level Packaging announced they will give the following paper at the IMAPS - 10(th) International Conference and Exhibition on Device Packaging 2014 in Scottsdale Arizona, USA. http://photos.prnewswire.com/prnvar/20120306/LA64593LOGO-a Dielectric Laser Via Drilling for Next Generation Wafer Level Processing Jim Zaccardi, FlipChip International (Guy...

2014-02-13 16:30:29

Merger creates an independent spin out company that will focus on developing nanotechnology market opportunities AUSTIN, Texas, Feb. 13, 2014 /PRNewswire/ -- Molecular Imprints Inc. (MII), the market and technology leader for nanopatterning systems and solutions, today announced it has signed an agreement to sell its semiconductor imprint lithography equipment business to Canon Inc. of Tokyo, Japan. Canon currently manufactures and markets KrF excimer and i-line illumination optical...

2014-02-11 08:40:10

EVG®150XT combines EV Group's expertise in lithography and XT Frame platform to enable industry's first HVM resist processing system for mid-end and back-end interconnect applications ST. FLORIAN, Austria, Feb. 11, 2014 /PRNewswire/ -- EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today unveiled its most advanced 300-mm photoresist processing system for logic and memory high-volume manufacturing...

2013-11-24 23:02:55

Rolith, Inc., a leader in advanced nanostructured devices, is pleased to announce that Printed Electronics Industry selected Rolith for the Best Manufacturing Technology award based on its production of transparent metal mesh conductors for large touch screen displays, OLED lighting and photovoltaics. Pleasanton, CA (PRWEB) November 24, 2013 Each year the Printed Electronics industry recognizes and awards outstanding achievement to those involved in the rapidly growing printed electronics...

2013-11-19 08:37:24

EVG®PHABLE(TM) combines sub-micron resolution of lithography steppers with low cost of ownership and ease of use of proximity aligners ST. FLORIAN, Austria, Nov. 19, 2013 /PRNewswire/ -- EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today introduced the EVG(®)PHABLE(TM) exposure system, which is designed specifically for manufacturing photonic components. Leveraging EVG's expertise in...

2013-10-28 08:35:30

EVG®6200 mask alignment system combines wafer bonding, photolithography and nanoimprint lithography in a single, highly flexible platform FREIBURG, Germany, Oct. 28, 2013 /PRNewswire/ -- MICROTAS -- EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that it has delivered an EVG(®)6200 semi-automated mask alignment system to Micronit, a manufacturer of lab-on-a-chip products used in...

2013-08-12 00:20:06

Pleasanton, Ca., Aug 12, 2013 - (ACN Newswire) - Rolith, Inc., a leader in developing advanced nanostructured devices, today announces the successful demonstration of Transparent Metal Grid Electrode technology based on its disruptive nanolithography method (Rolling Mask Lithography - RML(TM)).We see an explosive growth of touch screen displays in consumer electronics market. ITO (Indium Titanium Oxide) material is a standard solution for transparent electrodes so far. Apart from a...

2013-06-17 08:34:29

CoatsClean(TM) combines process, equipment and formulation technology to deliver innovative, low cost-of-ownership approach to single-wafer photoresist and residue removal ST. FLORIAN, Austria and INDIANAPOLIS, Ind., June 17, 2013 /PRNewswire/ -- EV Group (EVG), a leading supplier of wafer bonding and lithography equipment, and Dynaloy, LLC, an international manufacturer of chemicals for the electronics industry and wholly owned subsidiary of Eastman Chemical Company, today...

2013-03-07 00:20:07

Pleasanton, Ca., Mar 7, 2013 - (ACN Newswire) - Rolith, Inc., the leader in developing advanced nanostructured coatings and devices, today announces the successful installation of a 2nd-generation nanostructuring prototype tool built by SUSS MicroTec AG under exclusive license from Rolith, Inc. - the RML-2 tool. This prototype is based on a disruptive nanolithography method (Rolling Mask Lithography - RML(TM)) developed by Rolith, Inc. It enables users to create nanostructures over large...