Latest Photolithography Stories

Pleasanton, Ca., Mar 7, 2013 - (ACN Newswire) - Rolith, Inc., the leader in developing advanced nanostructured coatings and devices, today announces the successful installation of a 2nd-generation nanostructuring prototype tool built by SUSS MicroTec AG under exclusive license from Rolith, Inc. - the RML-2 tool. This prototype is based on a disruptive nanolithography method (Rolling Mask Lithography - RML(TM)) developed by Rolith, Inc. It enables users to create nanostructures over large...

This million-dollar investment adds to MicroConnex’ already extraordinary capability in the “sub 1 mil” category of tight lines and spaces within the niche market of complex flexible electronic circuitry. Specifically the new LDI streamlines MicroConnex’ proprietary processes with tighter and consistent trace, space, trace-to-edge and layer-to-layer registration. Snoqualmie, WA (PRWEB) January 21, 2013 MicroConnex, a rapidly growing Flex Circuit fabricator in the Seattle area who...

AUSTIN, Texas, Jan. 17, 2013 /PRNewswire/ -- Molecular Imprints, Inc., a technology leader in advanced semiconductor lithography, today announced the delivery of the first advanced lithography platform capable of patterning 450mm silicon wafer substrates. The Imprio(®) 450, was accepted by a leading semiconductor manufacturer at the end of 2012 and is now being used to support the 450mm wafer process development demands as part of a multi-year wafer services contract to...

Nanonex Corporation, the inventor and world’s leading provider in nanoimprint lithography solutions with the longest history, announces the delivery of Nanonex’s NX-2600BA system to University of Pennsylvania. Princeton, NJ (PRWEB) December 25, 2012 Nanonex Corporation, the inventor and world’s leading provider in nanoimprint lithography solutions with the longest history, announces the delivery of Nanonex’s NX-2600BA system to University of Pennsylvania. The Nanonex NX-2600BA...

SAN JOSE, Calif., Oct. 23, 2012 /PRNewswire/ -- Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today introduced its new in-line wafer inspection system, the Superfast 3G, which provides the flexibility to address a wide range of applications including improved overlay control and enhanced yield. The system has the flexibility to be implemented...

SAN JOSE, Calif., Oct. 22, 2012 /PRNewswire/ -- Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today announced a new laser spike anneal (LSA) product family?LSA201, LSA201LP, and LSA201HP?built on a new platform that provides full-wafer ambient control processing for sub-20nm nodes. The LSA201's simple and robust design includes Ultratech's patented...

SAN JOSE, Calif., Oct. 22, 2012 /PRNewswire/ -- Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today announced that it has introduced two new laser spike anneal (LSA) products based on its proprietary dual-beam laser technology, which enables expanded processing capabilities compared to conventional millisecond annealing tools. Both new products are based...

SAN JOSE, Calif., June 20, 2012 /PRNewswire/ -- Ultratech, Inc. (Nasdaq: UTEK), a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today announced the shipment of its 50th laser spike anneal (LSA) system. Among these 50 systems, Ultratech has shipped more than 15 of its flagship LSA101 systems, which can achieve throughputs of up to 60wph. Ultratech's unique long-wavelength LSA technology...

MIGDAL HAEMEK, Israel and NEWPORT BEACH, Calif., April 10, 2012 /PRNewswire/ -- TowerJazz, the global specialty foundry leader, today announced a paper presentation on a new "Run to Run Controller Replacement in Photolithography Area" at the 12th European APCM (Advanced Process Control and Manufacturing) Conference in Grenoble, France being held April 16-18, 2012. Anna Strulovich, Fab 2 Staff Photo Engineer, will present the paper following the implementation of this novel...

ST. FLORIAN, Austria, March 27, 2012 /PRNewswire/ -- EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that Himax Technologies, Inc., a leading producer of CMOS image sensors, power management devices and semiconductor devices and components used in flat panel displays, has placed a repeat order for an IQ Aligner UV nanoimprint lithography (UV-NIL) system from EVG. The IQ...