Latest Photomask Stories
PALO ALTO, Calif., Feb. 25, 2013 /PRNewswire/ -- Luminescent Technologies Inc. (Luminescent), the leading provider of Computational Metrology and Inspection solutions for the global semiconductor manufacturing industry and Dai Nippon Printing Company, Ltd. (DNP) announced today the successful completion of the first phase of a three (3)-year joint development program for computational metrology and inspection using Luminescent's Automated Image Processing Hub (LAIPH) platform. The...
ZUG, Switzerland, Nov. 13, 2012 /PRNewswire/ -- Adlyte Inc., a developer of high-brightness extreme light sources for advanced semiconductor inspection and metrology applications, today announced it has expanded its operations to better support its customers and gear up for growth. These measures include appointing industry veteran Joseph R. Bronson to its strategic advisory board and constructing a new, larger facility to expand its customer development efforts. One of three LPP...
SAN JOSE, Calif., Sept. 11, 2012 /PRNewswire/ -- D2S®, a supplier of computational design platforms, today unveiled TrueMask(TM) MDP--the first and only model-based mask data preparation (MB-MDP) solution to offer fully automated, full-chip mask data preparation for complex photomasks with Manhattanized, curvilinear and ideal inverse lithography technology (ILT) shapes within practical, cost-effective write-times. Developed to address complex mask designs at 20-nm-and-below...
SAN JOSE, Calif., Sept. 4, 2012 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced that several of its members will present the latest eBeam breakthroughs in mask technologies at the SPIE/BACUS Photomask Technology Symposium. The collaborative results demonstrate significant progress in meeting several key milestones outlined in the eBeam...
Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced order for two advanced VPG maskless lithography systems from an Asian based photomask production group. Heidelberg, Germany (PRWEB) April 29, 2012 Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced order for two advanced VPG maskless lithography systems from an Asian based photomask production...
SAN JOSE, Calif., April 16, 2012 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced that several of its members will present the latest breakthroughs using eBeam technologies to improve photomask critical dimension uniformity (CDU) and wafer yields this week during Photomask Japan (PMJ) 2012, the 19th international symposium on photomasks and...
SAN JOSE, Calif., Feb. 13, 2012 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced it will unveil its latest roadmap this week at the SPIE Advanced Lithography Symposium being held at the San Jose Convention Center in San Jose, Calif. The roadmap will identify key milestones to be met by the eBeam Initiative in the coming years to improve...
SAN JOSE, Calif., Feb. 13, 2012 /PRNewswire/ -- D2S®, a supplier of computational design platforms, today announced that it has bolstered its management team with the hiring of three semiconductor industry veterans with deep business and technology expertise in electron beam (eBeam), photomask and lithography technology. Sterling Watson has joined D2S as vice president of engineering, Anthony Adamov has joined the company as vice president of business development, and Ryan...
Heidelberg Instruments announced the sale of a DWL 200 maskless laser lithography system to the University of Minnesota Nanofabrication Center in Minneapolis, USA. (PRWEB) January 21, 2012 Heidelberg Instruments announced the sale of a DWL 200 maskless laser lithography system to the University of Minnesota Nanofabrication Center in Minneapolis, USA. The DWL 200 maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub...
Berkeley Lab scientists and colleagues will create an advanced extreme-ultraviolet microscope Moore’s Law, hardly a law but undeniably a persistent trend, says that every year and a half, the number of transistors that fit on a chip roughly doubles. It’s why electronics – from smart phones to flat screens, from MP4 players to movie cameras, from tablets to supercomputers – grow ever more varied, powerful, and compact, but also ever less expensive. Whether the trend can continue...
