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Last updated on April 24, 2014 at 5:50 EDT

Latest Photomask Stories

2014-02-25 12:31:12

Sage Design Automation becomes latest company to join eBeam Initiative SAN JOSE, Calif., Feb. 25, 2014 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced the top educational themes that it will highlight in 2014. These themes, which were identified based on member company feedback to the Initiative's most recent annual survey completed late...

2014-01-09 08:32:38

ROUND ROCK, Texas, Jan. 9, 2014 /PRNewswire/ -- Toppan Photomasks, Inc. (TPI), the world's preferred global partner for photomasks, is saddened to announce the death of President and CEO David Murray after a long battle with cancer. Mr. Murray was 55 years old. "Dave's accomplishments over his 33-year career are remarkable, but we will remember him most for his deep understanding of the photomask business and his authenticity and passion as a leader," said Yuichi Kumamoto, senior...

2013-09-09 12:31:35

SAN JOSE, Calif., Sept. 9, 2013 /PRNewswire/ -- D2S®, a supplier of computational design platforms, today announced that it has extended its partnership with NuFlare Technology, a world leader in electron beam (eBeam) mask writing systems, to accelerate the deployment of eBeam technologies that reduce write times and improve the accuracy of advanced photomasks for future design nodes leveraging general purpose graphic processing unit (GPGPU) acceleration. As part of this agreement,...

2013-09-09 12:31:29

Hitachi High-Technologies Joins eBeam Initiative SAN JOSE, Calif., Sept. 9, 2013 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced the completion of the second annual eBeam Initiative survey. 28 member companies from across the photomask supply chain participated in the survey. Participants provided their opinions on a variety of topics...

2013-02-25 08:43:18

PALO ALTO, Calif., Feb. 25, 2013 /PRNewswire/ -- Luminescent Technologies Inc. (Luminescent), the leading provider of Computational Metrology and Inspection solutions for the global semiconductor manufacturing industry and Dai Nippon Printing Company, Ltd. (DNP) announced today the successful completion of the first phase of a three (3)-year joint development program for computational metrology and inspection using Luminescent's Automated Image Processing Hub (LAIPH) platform. The goals of...

2012-11-13 12:32:29

ZUG, Switzerland, Nov. 13, 2012 /PRNewswire/ -- Adlyte Inc., a developer of high-brightness extreme light sources for advanced semiconductor inspection and metrology applications, today announced it has expanded its operations to better support its customers and gear up for growth. These measures include appointing industry veteran Joseph R. Bronson to its strategic advisory board and constructing a new, larger facility to expand its customer development efforts. One of three LPP EUV...

2012-09-11 06:31:29

SAN JOSE, Calif., Sept. 11, 2012 /PRNewswire/ -- D2S®, a supplier of computational design platforms, today unveiled TrueMask(TM) MDP--the first and only model-based mask data preparation (MB-MDP) solution to offer fully automated, full-chip mask data preparation for complex photomasks with Manhattanized, curvilinear and ideal inverse lithography technology (ILT) shapes within practical, cost-effective write-times. Developed to address complex mask designs at 20-nm-and-below process...

2012-09-04 06:31:11

SAN JOSE, Calif., Sept. 4, 2012 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced that several of its members will present the latest eBeam breakthroughs in mask technologies at the SPIE/BACUS Photomask Technology Symposium. The collaborative results demonstrate significant progress in meeting several key milestones outlined in the eBeam Initiative...

2012-04-29 23:01:42

Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced order for two advanced VPG maskless lithography systems from an Asian based photomask production group. Heidelberg, Germany (PRWEB) April 29, 2012 Heidelberg Instruments, GmbH, Heidelberg, Germany, a leading supplier of direct write laser lithography systems, announced order for two advanced VPG maskless lithography systems from an Asian based photomask production...

2012-04-16 06:29:14

SAN JOSE, Calif., April 16, 2012 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced that several of its members will present the latest breakthroughs using eBeam technologies to improve photomask critical dimension uniformity (CDU) and wafer yields this week during Photomask Japan (PMJ) 2012, the 19th international symposium on photomasks and...