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Last updated on April 18, 2014 at 9:25 EDT

Latest Photomask Stories

2012-02-13 11:00:00

SAN JOSE, Calif., Feb. 13, 2012 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced it will unveil its latest roadmap this week at the SPIE Advanced Lithography Symposium being held at the San Jose Convention Center in San Jose, Calif. The roadmap will identify key milestones to be met by the eBeam Initiative in the coming years to improve mask...

2012-02-13 11:00:00

SAN JOSE, Calif., Feb. 13, 2012 /PRNewswire/ -- D2S®, a supplier of computational design platforms, today announced that it has bolstered its management team with the hiring of three semiconductor industry veterans with deep business and technology expertise in electron beam (eBeam), photomask and lithography technology. Sterling Watson has joined D2S as vice president of engineering, Anthony Adamov has joined the company as vice president of business development, and Ryan...

2012-01-21 08:00:00

Heidelberg Instruments announced the sale of a DWL 200 maskless laser lithography system to the University of Minnesota Nanofabrication Center in Minneapolis, USA. (PRWEB) January 21, 2012 Heidelberg Instruments announced the sale of a DWL 200 maskless laser lithography system to the University of Minnesota Nanofabrication Center in Minneapolis, USA. The DWL 200 maskless lithography system is capable of binary and gray scale exposure, layer to layer alignment, and is able to produce sub...

Image 1 - A SHARP New Microscope For Next Generation Of Microchips
2011-11-01 04:00:03

Berkeley Lab scientists and colleagues will create an advanced extreme-ultraviolet microscope Moore´s Law, hardly a law but undeniably a persistent trend, says that every year and a half, the number of transistors that fit on a chip roughly doubles. It´s why electronics — from smart phones to flat screens, from MP4 players to movie cameras, from tablets to supercomputers — grow ever more varied, powerful, and compact, but also ever less expensive. Whether the trend...

2011-09-20 11:00:00

SAN JOSE, Calif., Sept. 20, 2011 /PRNewswire/ -- D2S(TM), a supplier of computational design platforms, today introduced TrueMask(TM) DS, the industry's first mask-wafer double simulation accelerated workstation for R&D exploration, bit-cell design, hot-spot analysis and mask-defect categorization that comprehends overlapping eBeam shots and dose modulation. TrueMask DS is an essential tool for mask shops and wafer fabs in qualifying and optimizing 20-nm-node and below designs, where...

2011-09-12 11:00:00

SAN JOSE, Calif., Sept. 12, 2011 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced that several of its members will present the latest eBeam breakthroughs in mask and direct write technologies at the SPIE/BACUS Photomask Symposium 2011--a worldwide technical conference and exhibition for the photomask industry. The collaborative results...

2011-09-10 07:00:00

Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced an order for a VPG 800 Maskless Lithography System from the Taiwan based Kinsus Interconnect Technology Corp . VPG 800 is an ideal for high volume production of todayâs demanding photomasks for various applications, including the advanced electronic packaging. (PRWEB) September 10, 2011 Heidelberg Instruments, a leader in design, development and production of laser...

2011-06-07 15:15:00

MILPITAS, Calif., June 7, 2011 /PRNewswire/ -- Today KLA-Tencor Corporation(TM) (NASDAQ: KLAC) announced shipment of the first LMS IPRO5 reticle pattern placement metrology system. The recipient, the Advanced Mask Technology Center (AMTC) in Dresden, Germany, intends to use the system to support development of advanced reticle technology that will be used to pattern the most critical layers of the industry's next-generation integrated circuits. The development of the LMS IPRO5 was...

2011-05-17 10:32:00

ALLENTOWN, Pa., May 17, 2011 /PRNewswire/ -- Akrion Systems LLC ("Akrion Systems"), a supplier of advanced surface preparation processes and equipment for microelectronics and solar device manufacturers, announced today that the company has placed a Velocity single wafer tool at a leading edge memory products manufacturer in Asia for the purpose of demonstrating its pre-lithography cleaning capabilities. Velocity is Akrion Systems' most advanced single-wafer platform and more than sixty...

2011-03-01 14:30:00

SAN JOSE, Calif., March 1, 2011 /PRNewswire/ -- Fellow eBeam Initiative members D2S(TM), an emerging supplier of computational design platforms, and NuFlare Technology, Inc., a world leader in electron beam mask writing systems, today announced a partnership to provide a D2S option for the NuFlare EBM-7000 mask writing system. A new interface developed between NuFlare and D2S enables the overlapping of shots that was previously not allowed in NuFlare machines. Further, NuFlare today...