Latest Photomask Stories
SANTA CLARA, Calif., May 17 /PRNewswire/ -- SolutionSoft Systems Inc., today announced the continued success of SafeVelocity(TM) at Photronics, the industry leader in the design, development and production of reticles and photomasks for semiconductor and microelectronic applications. SafeVelocity addresses the problems of transferring large files by significantly increasing transfer reliability, security and throughput. "Our customers experience virtually error free transfers and...
SAN JOSE, Calif., April 13 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced a partnership with fellow eBeam Initiative member JEOL Ltd. to provide a new mask data preparation (MDP) infrastructure that is optimized for JEOL's new JBX-3200MV mask writing system. JEOL, a world leader in electron optical equipment and instrumentation, will use D2S' patent-pending, model-based MDP technology for both variable-shaped beam (VSB) lithography and the newly-announced...
SAN JOSE, Calif., April 13 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in design-for-e-beam (DFEB) mask technology at Photomask Japan 2010--one of the world's premier symposia for advanced lithography mask technology. The joint proof points demonstrate the progress and effectiveness...
SAN JOSE, Calif., Feb. 23 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced its new design for e-beam (DFEB) mask technology for the production of advanced optical photomasks with circular and curvilinear shapes. Used in conjunction with currently available e-beam mask writing equipment, D2S DFEB mask technology reduces the write times for masks containing complex or curvilinear features to enable the extension of 193-nm immersion lithography to the 22-nm...
SAN JOSE, Calif., Feb. 23 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that six additional companies spanning the entire semiconductor value chain have joined the Initiative to support the new DFEB mask roadmap for high-volume applications. The roadmap incorporates new innovations to e-beam mask making using DFEB in conjunction with e-beam mask writing...
AUSTIN, Texas, Feb. 16 /PRNewswire/ -- Molecular Imprints, Inc., the market and technology leader for nanopatterning systems and solutions, today announced that it is upgrading its Imprio® 250 nanopatterning system, installed at the Device Process Development Center of Toshiba's Corporate Research and Development Center, to an Imprio 300. Molecular Imprints' Imprio 300 system represents the highest resolution and lowest cost-of-ownership (CoO) patterning solution for IC prototyping and...
PALO ALTO, Calif., July 23 /PRNewswire/ -- Luminescent Technologies, Inc., the leading provider of computational lithography solutions to the global semiconductor industry, has broadened its portfolio by adding the industry's first offline computational inspection product to its solutions set. With its existing portfolio of advanced computational lithography solutions, the move represents a natural extension of Luminescent's expertise into the critical area of photomask inspection. A...
AUSTIN, Texas., July 1 /PRNewswire/ -- Dai Nippon Printing Co., Ltd. (DNP), the world's leading producer of semiconductor photomasks, and Molecular Imprints, Inc., the market and technology leader for nanopatterning systems and solutions, today announced that they have entered into a strategic collaboration agreement to speed the commercialization of nanoimprint lithography for high-volume semiconductor device manufacturing. Under the terms of the agreement, DNP will provide Molecular...
Relative merits of imprint lithography and EUV to be debated at the ConFab conference AUSTIN, Texas, June 10 /PRNewswire/ -- Molecular Imprints, Inc., the market and technology leader for nanopatterning systems and solutions, today announced that its innovative Jet and Flash Imprint Lithography (J-FIL) nanopatterning solution continues to gain momentum in non-volatile memory (NVM) markets, with the company progressing along its technology roadmap and realizing key performance milestones....
In response to ever increasing demands for smaller, more powerful and energy-efficient devices for cloud computing and high-performance servers, IBM (NYSE: IBM) today announced the semiconductor industry's first computationally based process for production of next generation 22nm semiconductors. Known as Computational Scaling (CS) -- a process that enables the production of complex, powerful and energy-efficient semiconductors at 22nms and beyond -- this new initiative will feature support...
