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Latest Photomask Stories

2011-05-17 10:32:00

ALLENTOWN, Pa., May 17, 2011 /PRNewswire/ -- Akrion Systems LLC ("Akrion Systems"), a supplier of advanced surface preparation processes and equipment for microelectronics and solar device manufacturers, announced today that the company has placed a Velocity single wafer tool at a leading edge memory products manufacturer in Asia for the purpose of demonstrating its pre-lithography cleaning capabilities. Velocity is Akrion Systems' most advanced single-wafer platform and more than sixty...

2011-03-01 14:30:00

SAN JOSE, Calif., March 1, 2011 /PRNewswire/ -- Fellow eBeam Initiative members D2S(TM), an emerging supplier of computational design platforms, and NuFlare Technology, Inc., a world leader in electron beam mask writing systems, today announced a partnership to provide a D2S option for the NuFlare EBM-7000 mask writing system. A new interface developed between NuFlare and D2S enables the overlapping of shots that was previously not allowed in NuFlare machines. Further, NuFlare today...

2011-01-12 09:09:00

AUSTIN, Texas, Jan. 12, 2011 /PRNewswire/ -- Molecular Imprints, Inc., the market and technology leader for nanoimprint lithography systems and solutions, today introduced the Perfecta MR5000 -- its new Jet and Flash(TM) Imprint Lithography (J-FIL(TM)) imprint mask replication platform for the semiconductor industry. Representing the industry's first nanopatterning system specifically designed to replicate 6025 imprint masks, the Perfecta MR5000 enables multiple identical replica masks...

2010-10-28 10:00:00

JENA, Germany and MOUNTAIN VIEW, Calif., Oct. 28 /PRNewswire/ -- Carl Zeiss SMS GmbH, a leading supplier for photomask metrology and repair tools and Synopsys, Inc. (Nasdaq: SNPS), a world leader in software and IP for semiconductor design, verification and manufacturing, today announced a collaboration to support the ZEISS tool family for in-die metrology solutions for the 32-nanometer (nm) technology node and below. Synopsys will offer support for ZEISS' PROVE(TM), the next-generation...

2010-09-07 11:00:00

SAN JOSE, Calif., Sept. 7 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in DFEB mask technology at the Annual SPIE/BACUS Symposium 2010--a worldwide technical conference and exhibition and premier event for the photomask industry. The collaborative results demonstrate the...

2010-09-01 11:26:00

MOUNTAIN VIEW, Calif., Sept. 1 /PRNewswire/ -- MCA, a global high-tech communications agency, today announced it will be hosting its next online panel discussion in cooperation with SemiNeedle, dubbed the BrightSpots Lithography Forum, which will enable industry professionals to partake in an active discussion exploring the key issues surrounding the future of lithography. On Tuesday, September 14, a live panel event, also available online, will be held during the SPIE/BACUS Photomask...

2010-05-17 09:00:00

SANTA CLARA, Calif., May 17 /PRNewswire/ -- SolutionSoft Systems Inc., today announced the continued success of SafeVelocity(TM) at Photronics, the industry leader in the design, development and production of reticles and photomasks for semiconductor and microelectronic applications. SafeVelocity addresses the problems of transferring large files by significantly increasing transfer reliability, security and throughput. "Our customers experience virtually error free transfers and...

2010-04-13 21:30:00

SAN JOSE, Calif., April 13 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced a partnership with fellow eBeam Initiative member JEOL Ltd. to provide a new mask data preparation (MDP) infrastructure that is optimized for JEOL's new JBX-3200MV mask writing system. JEOL, a world leader in electron optical equipment and instrumentation, will use D2S' patent-pending, model-based MDP technology for both variable-shaped beam (VSB) lithography and the...

2010-04-13 21:30:00

SAN JOSE, Calif., April 13 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in design-for-e-beam (DFEB) mask technology at Photomask Japan 2010--one of the world's premier symposia for advanced lithography mask technology. The joint proof points demonstrate the progress and...

2010-02-23 14:15:00

SAN JOSE, Calif., Feb. 23 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced its new design for e-beam (DFEB) mask technology for the production of advanced optical photomasks with circular and curvilinear shapes. Used in conjunction with currently available e-beam mask writing equipment, D2S DFEB mask technology reduces the write times for masks containing complex or curvilinear features to enable the extension of 193-nm immersion lithography to the 22-nm...


Word of the Day
monteith
  • A large punch-bowl of the eighteenth century, usually of silver and with a movable rim, and decorated with flutings and a scalloped edge. It was also used for cooling and carrying wine-glasses.
  • A kind of cotton handkerchief having white spots on a colored ground, the spots being produced by a chemical which discharges the color.
This word is possibly named after Monteith (Monteigh), 'an eccentric 17th-century Scotsman who wore a cloak scalloped at the hem.'
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