Latest Photomask Stories
Berkeley Lab scientists and colleagues will create an advanced extreme-ultraviolet microscope.
Heidelberg Instruments, a leader in design, development and production of laser lithography systems, announced an order for a VPG 800 Maskless Lithography System from the Taiwan based Kinsus Interconnect
MILPITAS, Calif., June 7, 2011 /PRNewswire/ -- Today KLA-Tencor Corporation(TM) (NASDAQ: KLAC) announced shipment of the first LMS IPRO5 reticle pattern placement metrology system.
ALLENTOWN, Pa., May 17, 2011 /PRNewswire/ -- Akrion Systems LLC ("Akrion Systems"), a supplier of advanced surface preparation processes and equipment for microelectronics and solar device manufacturers, announced today that the company has placed a Velocity single wafer tool at a leading edge memory products manufacturer in Asia for the purpose of demonstrating its pre-lithography cleaning capabilities. Velocity is Akrion Systems' most advanced single-wafer platform and more than sixty...
SAN JOSE, Calif., March 1, 2011 /PRNewswire/ -- Fellow eBeam Initiative members D2S(TM), an emerging supplier of computational design platforms, and NuFlare Technology, Inc., a world leader in electron beam mask writing systems, today announced a partnership to provide a D2S option for the NuFlare EBM-7000 mask writing system.
AUSTIN, Texas, Jan.
JENA, Germany and MOUNTAIN VIEW, Calif., Oct. 28 /PRNewswire/ -- Carl Zeiss SMS GmbH, a leading supplier for photomask metrology and repair tools and Synopsys, Inc.
SAN JOSE, Calif., Sept.
- The abrogation of a law by a higher authority; annulment.