Quantcast
Last updated on April 18, 2014 at 5:30 EDT

Latest Photomask Stories

2011-01-12 09:09:00

AUSTIN, Texas, Jan. 12, 2011 /PRNewswire/ -- Molecular Imprints, Inc., the market and technology leader for nanoimprint lithography systems and solutions, today introduced the Perfecta MR5000 -- its new Jet and Flash(TM) Imprint Lithography (J-FIL(TM)) imprint mask replication platform for the semiconductor industry. Representing the industry's first nanopatterning system specifically designed to replicate 6025 imprint masks, the Perfecta MR5000 enables multiple identical replica masks...

2010-10-28 10:00:00

JENA, Germany and MOUNTAIN VIEW, Calif., Oct. 28 /PRNewswire/ -- Carl Zeiss SMS GmbH, a leading supplier for photomask metrology and repair tools and Synopsys, Inc. (Nasdaq: SNPS), a world leader in software and IP for semiconductor design, verification and manufacturing, today announced a collaboration to support the ZEISS tool family for in-die metrology solutions for the 32-nanometer (nm) technology node and below. Synopsys will offer support for ZEISS' PROVE(TM), the next-generation...

2010-09-07 11:00:00

SAN JOSE, Calif., Sept. 7 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in DFEB mask technology at the Annual SPIE/BACUS Symposium 2010--a worldwide technical conference and exhibition and premier event for the photomask industry. The collaborative results demonstrate the...

2010-09-01 11:26:00

MOUNTAIN VIEW, Calif., Sept. 1 /PRNewswire/ -- MCA, a global high-tech communications agency, today announced it will be hosting its next online panel discussion in cooperation with SemiNeedle, dubbed the BrightSpots Lithography Forum, which will enable industry professionals to partake in an active discussion exploring the key issues surrounding the future of lithography. On Tuesday, September 14, a live panel event, also available online, will be held during the SPIE/BACUS Photomask...

2010-05-17 09:00:00

SANTA CLARA, Calif., May 17 /PRNewswire/ -- SolutionSoft Systems Inc., today announced the continued success of SafeVelocity(TM) at Photronics, the industry leader in the design, development and production of reticles and photomasks for semiconductor and microelectronic applications. SafeVelocity addresses the problems of transferring large files by significantly increasing transfer reliability, security and throughput. "Our customers experience virtually error free transfers and...

2010-04-13 21:30:00

SAN JOSE, Calif., April 13 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced a partnership with fellow eBeam Initiative member JEOL Ltd. to provide a new mask data preparation (MDP) infrastructure that is optimized for JEOL's new JBX-3200MV mask writing system. JEOL, a world leader in electron optical equipment and instrumentation, will use D2S' patent-pending, model-based MDP technology for both variable-shaped beam (VSB) lithography and the...

2010-04-13 21:30:00

SAN JOSE, Calif., April 13 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in design-for-e-beam (DFEB) mask technology at Photomask Japan 2010--one of the world's premier symposia for advanced lithography mask technology. The joint proof points demonstrate the progress and...

2010-02-23 14:15:00

SAN JOSE, Calif., Feb. 23 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced its new design for e-beam (DFEB) mask technology for the production of advanced optical photomasks with circular and curvilinear shapes. Used in conjunction with currently available e-beam mask writing equipment, D2S DFEB mask technology reduces the write times for masks containing complex or curvilinear features to enable the extension of 193-nm immersion lithography to the 22-nm...

2010-02-23 14:15:00

SAN JOSE, Calif., Feb. 23 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that six additional companies spanning the entire semiconductor value chain have joined the Initiative to support the new DFEB mask roadmap for high-volume applications. The roadmap incorporates new innovations to e-beam mask making using DFEB in conjunction with e-beam mask writing...

2010-02-16 06:30:00

AUSTIN, Texas, Feb. 16 /PRNewswire/ -- Molecular Imprints, Inc., the market and technology leader for nanopatterning systems and solutions, today announced that it is upgrading its Imprio® 250 nanopatterning system, installed at the Device Process Development Center of Toshiba's Corporate Research and Development Center, to an Imprio 300. Molecular Imprints' Imprio 300 system represents the highest resolution and lowest cost-of-ownership (CoO) patterning solution for IC...