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Last updated on April 17, 2014 at 1:21 EDT

Latest Photomask Stories

2009-07-23 13:00:00

PALO ALTO, Calif., July 23 /PRNewswire/ -- Luminescent Technologies, Inc., the leading provider of computational lithography solutions to the global semiconductor industry, has broadened its portfolio by adding the industry's first offline computational inspection product to its solutions set. With its existing portfolio of advanced computational lithography solutions, the move represents a natural extension of Luminescent's expertise into the critical area of photomask inspection. A...

2009-07-01 12:00:00

AUSTIN, Texas., July 1 /PRNewswire/ -- Dai Nippon Printing Co., Ltd. (DNP), the world's leading producer of semiconductor photomasks, and Molecular Imprints, Inc., the market and technology leader for nanopatterning systems and solutions, today announced that they have entered into a strategic collaboration agreement to speed the commercialization of nanoimprint lithography for high-volume semiconductor device manufacturing. Under the terms of the agreement, DNP will provide Molecular...

2009-06-10 15:30:00

Relative merits of imprint lithography and EUV to be debated at the ConFab conference AUSTIN, Texas, June 10 /PRNewswire/ -- Molecular Imprints, Inc., the market and technology leader for nanopatterning systems and solutions, today announced that its innovative Jet and Flash Imprint Lithography (J-FIL) nanopatterning solution continues to gain momentum in non-volatile memory (NVM) markets, with the company progressing along its technology roadmap and realizing key performance milestones. An...

2008-09-17 15:00:18

In response to ever increasing demands for smaller, more powerful and energy-efficient devices for cloud computing and high-performance servers, IBM (NYSE: IBM) today announced the semiconductor industry's first computationally based process for production of next generation 22nm semiconductors. Known as Computational Scaling (CS) -- a process that enables the production of complex, powerful and energy-efficient semiconductors at 22nms and beyond -- this new initiative will feature support...

2008-08-21 18:00:43

Photronics, Inc. (Nasdaq:PLAB), a worldwide leader in supplying innovative photomask-based imaging solutions for the global electronics and display industries, announced today that Peter S. Kirlin, Ph.D. has been named Senior Vice President - U.S. & Europe. In this newly created position, Kirlin has assumed responsibility for the mainstream mask business in both the U.S. and Europe and will report directly to Constantine ("Deno") Macricostas, the Company's Chairman and interim Chief...

2008-06-19 15:00:15

Toppan Printing Co., Ltd. (Toppan Printing; Head office: Chiyoda-ku, Tokyo; President & CEO: Naoki Adachi) today announced that it has entered into a new development agreement with IBM that covers the last phase of 32nm photomask process development, and all phases of 22nm photomask process development. This joint development will take place at IBM's Burlington photomask facility in Essex Junction, VT., starting in June 2008. Photomasks are used to transfer semiconductor chip...