Latest Photomask Stories
MOUNTAIN VIEW, Calif., Sept.
SANTA CLARA, Calif., May 17 /PRNewswire/ -- SolutionSoft Systems Inc., today announced the continued success of SafeVelocity(TM) at Photronics, the industry leader in the design, development and production of reticles and photomasks for semiconductor and microelectronic applications.
SAN JOSE, Calif., April 13 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced a partnership with fellow eBeam Initiative member JEOL Ltd. to provide a new mask data preparation (MDP) infrastructure that is optimized for JEOL's new JBX-3200MV mask writing system.
SAN JOSE, Calif., April 13 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in design-for-e-beam (DFEB) mask technology at Photomask Japan 2010--one of the world's premier symposia for advanced lithography mask technology.
SAN JOSE, Calif., Feb. 23 /PRNewswire/ -- D2S(TM), an emerging design and software company, today announced its new design for e-beam (DFEB) mask technology for the production of advanced optical photomasks with circular and curvilinear shapes.
SAN JOSE, Calif., Feb.
AUSTIN, Texas, Feb.
PALO ALTO, Calif., July 23 /PRNewswire/ -- Luminescent Technologies, Inc., the leading provider of computational lithography solutions to the global semiconductor industry, has broadened its portfolio by adding the industry's first offline computational inspection product to its solutions set.
AUSTIN, Texas., July 1 /PRNewswire/ -- Dai Nippon Printing Co., Ltd.
Relative merits of imprint lithography and EUV to be debated at the ConFab conference AUSTIN, Texas, June 10 /PRNewswire/ -- Molecular Imprints, Inc., the market and technology leader for nanopatterning systems and solutions, today announced that its innovative Jet and Flash Imprint Lithography (J-FIL) nanopatterning solution continues to gain momentum in non-volatile memory (NVM) markets, with the company progressing along its technology roadmap and realizing key performance milestones.
- a slit in a tire to drain away surface water and improve traction.